SCHEMBL21667243

SCHEMBL21667243

C=C(C)C(=O)Oc1ccc(C(=O)OC(C)(C)C)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 8/20 0.58
KMT2A Q03164 3/20 0.47
ATM Q13315 1/20 0.47
CA1 P00915 2/20 0.44
CA2 P00918 2/20 0.44
CA12 O43570 1/20 0.44
CA9 Q16790 1/20 0.44
CA14 Q9ULX7 1/20 0.44
MAPT P10636 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
POLB P06746 1/20 0.38
APEX1 P27695 1/20 0.38
HTT P42858 1/20 0.38
PRSS1 P07477 1/20 0.38
ACR P10323 1/20 0.38
MEN1 O00255 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
GABRA1 P14867 1/20 0.37
GABRG2 P18507 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12196750 0.84 ELANE (0.67) ELANEKMT2AATMMAPTTDP1
SCHEMBL17433317 0.84 ELANE (0.67) ELANEKMT2AATMMAPTTDP1
SCHEMBL9707101 0.83 ELANE (0.62) ELANEKMT2AATMCA2MAPT
SCHEMBL5984170 0.83 ELANE (0.61) ELANEKMT2ACA1CA2CA12
SCHEMBL25699038 0.83 ELANE (0.61) ELANEKMT2AATMMAPTTDP1
SCHEMBL4902051 0.81 ELANE (0.63) ELANEKMT2AATMCA1CA2
SCHEMBL25968073 0.81 ELANE (0.63) ELANEKMT2AATMCA1CA2
SCHEMBL23558651 0.80 ELANE (0.48) ELANEKMT2AATMMAPTTDP1
SCHEMBL56436 0.80 ELANE (0.69) ELANEKMT2AATMMAPTTDP1
SCHEMBL22250958 0.80 ELANE (0.61) ELANEKMT2AATMMAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244143-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND JSR CORPORATION (JP) 2023-08-03 US disclosed
US-20230244143-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND JSR CORPORATION (JP) 2023-08-03 US disclosed
WO-2021140761-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND JSR株式会社 2021-07-15 WO disclosed
US-20200341376-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID JSR CORPORATION (JP) 2020-10-29 US disclosed
US-20200040119-A1 BLOCK COPOLYMER AND PREPARATION METHOD AND APPLICATION THEREOF FUDAN UNIVERSITY (CN) 2020-02-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200341376-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID RER1, TAS1R1, RAD51 ELANE 1915/4885KMT2A 2654/4885ATM 1165/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.