SCHEMBL2166885

SCHEMBL2166885

C1CCCCCCCCC1.C1CCCCCCCCC1.CC(=CC1(CO)CCCCCCCCC1CO)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL487043 0.98
Cyclopentane SCHEMBL5487227 0.95 ARG1 (0.30)
SCHEMBL2770837 0.75 ARG1 (0.32)
SCHEMBL2770840 0.75 ARG1 (0.32)
SCHEMBL6525185 0.70
SCHEMBL6525025 0.67 NAAA (0.30)
SCHEMBL15514191 0.67
Methacrylic Acid SCHEMBL4121521 0.67
Methacrylic Acid SCHEMBL4114548 0.67
Methacrylic Acid SCHEMBL4133482 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3444644-B1 COMPOSITION FOR HIGH REFRACTIVE INDEX LOW DISPERSION RESINS FOR COMPOSITE DIFFRACTION OPTICAL ELEMENTS, AND COMPOSITE DIFFRACTION OPTICAL ELEMENT USING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2023-10-11 EP claimed
US-11214650-B2 Composition for high refractive index low dispersion resins for composite diffractive optical elements, and composite diffractive optical element using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-01-04 US claimed
US-20230357488-A1 CURABLE RESIN COMPOSITION CANON KK (JP) 2023-11-09 US disclosed
EP-3444644-B1 COMPOSITION FOR HIGH REFRACTIVE INDEX LOW DISPERSION RESINS FOR COMPOSITE DIFFRACTION OPTICAL ELEMENTS, AND COMPOSITE DIFFRACTION OPTICAL ELEMENT USING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2023-10-11 EP disclosed
US-20230212440-A1 ADHESIVE COMPOSITION AND WAFER PROCESSING TAPE INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-07-06 US disclosed
WO-2023079622-A1 INKJET INK FOR PARTITION WALL FORMATION, INKJET INK SET FOR PARTITION WALL FORMATION, AND LED DEVICE MANUFACTURING METHOD コニカミノルタ株式会社 2023-05-11 WO disclosed
WO-2023079620-A1 INKJET INK FOR FORMING PARTITION, INKJET INK SET FOR FORMING PARTITION, METHOD FOR MANUFACTURING LED DEVICE, AND LED DEVICE コニカミノルタ株式会社 2023-05-11 WO disclosed
US-11214650-B2 Composition for high refractive index low dispersion resins for composite diffractive optical elements, and composite diffractive optical element using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-01-04 US disclosed
WO-2020158767-A1 EXPANSION METHOD AND SEMICONDUCTOR DEVICE PRODUCTION METHOD リンテック株式会社 2020-08-06 WO disclosed
US-10353125-B2 Polarizing plate and image display device including the same LG CHEM, LTD. (KR) 2019-07-16 US disclosed
US-20190177469-A1 CURABLE RESIN COMPOSITION CANON KABUSHIKI KAISHA (JP) 2019-06-13 US disclosed
US-20140285596-A1 RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2014-09-25 US disclosed
EP-2781359-A1 Recording apparatus Seiko Epson Corporation (JP) 2014-09-24 EP disclosed
US-20130279003-A1 POLARIZER HAVING PROTECTION FILMS IN TWO SIDES AND OPTICAL DEVICE COMPRISING THE SAME Shanjin Optoelectronics (Nanjing) Co., Ltd. (CN) 2013-10-24 US disclosed
US-20110183127-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
US-20100244073-A1 ORGANIC ELECTROLUMINESCENT DEVICE AND METHOD FOR MANUFACTURING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-09-30 US disclosed
US-20100227993-A1 Resin Composition and Optical Material Using the Same HITACHI CHEMICAL CO., LTD. (JP) 2010-09-09 US disclosed
EP-2180762-A1 ORGANIC ELECTROLUMINESCENT DEVICE AND METHOD FOR MANUFACTURING THE SAME Sumitomo Chemical Company, Limited (JP) 2010-04-28 EP disclosed
EP-1985640-A1 RESIN COMPOSITION AND OPTICAL MEMBER USING CURED PRODUCT OF SUCH RESIN COMPOSITION Hitachi Chemical Co., Ltd. (JP) 2008-10-29 EP disclosed
JP-2001040248-A ACTIVE ENERGY RAY-CURABLE COATING COMPOSITION SANYO CHEM IND LTD 2001-02-13 JP disclosed