⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6525025 | 0.88 | NAAA (0.30) | — | |
| SCHEMBL989309 | 0.71 | — | — | |
| SCHEMBL2064948 | 0.71 | — | — | |
| SCHEMBL487043 | 0.71 | — | — | |
| SCHEMBL6522429 | 0.70 | CYP2C19 (0.31) | — | |
| SCHEMBL3288533 | 0.70 | CYP2C19 (0.31) | — | |
| SCHEMBL2680377 | 0.70 | CYP2C19 (0.31) | — | |
| SCHEMBL479236 | 0.70 | CYP2C19 (0.31) | — | |
| SCHEMBL3292924 | 0.70 | CYP2C19 (0.31) | — | |
| SCHEMBL3291143 | 0.70 | CYP2C19 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110053083-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | US | claimed |
| US-20110053083-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | US | disclosed |