SCHEMBL2167747

SCHEMBL2167747

CC(=O)C(C)C(=O)OC(C)(C)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.40
MEN1 O00255 1/20 0.34
MAPK1 P28482 1/20 0.34
KMT2A Q03164 1/20 0.34
ALDH1A1 P00352 5/20 0.33
EPHX1 P07099 1/20 0.33
NPC1 O15118 1/20 0.33
EPHX2 P34913 2/20 0.32
CYP17A1 P05093 1/20 0.32
CYP19A1 P11511 1/20 0.32
MAPT P10636 1/20 0.30
ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26939367 0.87 SMN1; SMN2 (0.36) CA2MEN1MAPK1KMT2AALDH1A1
SCHEMBL9608676 0.85 MEN1 (0.36) MEN1MAPK1KMT2AALDH1A1EPHX1
SCHEMBL441785 0.83 MEN1 (0.39) MEN1MAPK1KMT2AEPHX1EPHX2
SCHEMBL17577430 0.82 MEN1 (0.35) MEN1MAPK1KMT2AALDH1A1EPHX1
SCHEMBL14539789 0.79 MEN1 (0.33) MEN1MAPK1KMT2AALDH1A1EPHX1
SCHEMBL111708 0.79 ALDH1A1 (0.38) MEN1MAPK1KMT2AALDH1A1EPHX2
SCHEMBL14559854 0.79 PRKCA (0.32) CA2MEN1MAPK1KMT2AALDH1A1
SCHEMBL17049827 0.76 KMT2A (0.41) CA2MEN1MAPK1KMT2AALDH1A1
SCHEMBL19075500 0.76 CYP17A1 (0.38) MEN1MAPK1KMT2AEPHX1NPC1
SCHEMBL18595654 0.76 ALDH1A1 (0.33) MEN1MAPK1KMT2AALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507174-B2 Positive resist composition, pattern forming method using the composition, and compound for use in the composition FUJIFILM CORPORATION (JP) 2013-08-13 US disclosed
EP-2450746-A1 Positive resist composition and pattern forming method using the composition Fujifilm Corporation (JP) 2012-05-09 EP disclosed
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
EP-2177506-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION Fujifilm Corporation (JP) 2010-04-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION CROCC, ACTR2, MRE11 CA2 1811/4885MEN1 4100/4885MAPK1 2745/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.