Tetrylammonium

Tetrylammonium

SCHEMBL2168516

CC[N+](CC)(CC)CC.[HH].[OH-]

nearest known ligand 0.80

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Known targets — ChEMBL curated mechanism

GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ

The experimentally established mechanism targets of Tetrylammonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.80
NFKB1 P19838 1/20 0.80
KCNA1 Q09470 1/20 0.80
KDM4E B2RXH2 1/20 0.73
PMP22 Q01453 1/20 0.73
ATM Q13315 1/20 0.73
DNM1 Q05193 4/20 0.37
SLC22A1 O15245 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrylammonium SCHEMBL21268035 0.95 TSHR (0.89) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL25372 0.95 TSHR (0.89) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL5142179 0.95 TSHR (0.89) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL11589433 0.90 KDM4E (0.90) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL1535434 0.90 TSHR (0.80) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL23853867 0.90 TSHR (0.80) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL9130306 0.90 TSHR (0.80) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL9229254 0.90 TSHR (0.80) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL9229252 0.90 TSHR (0.80) TSHRNFKB1KCNA1KDM4EPMP22
Tetrylammonium SCHEMBL3176651 0.90 TSHR (0.80) TSHRNFKB1KCNA1KDM4EPMP22

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2355138-B1 LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METHOD OF PRODUCING LIQUID DISCHARGE HEAD SUBSTRATE CANON KK (JP) 2016-08-24 EP disclosed
CN-102191063-B Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate CANON KK 2014-04-02 CN disclosed
US-8492281-B2 Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate CANON KABUSHIKI KAISHA (JP) 2013-07-23 US disclosed
US-20120289055-A1 LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METHOD OF PRODUCING LIQUID DISCHARGE HEAD SUBSTRATE CANON KABUSHIKI KAISHA (JP) 2012-11-15 US disclosed
CN-102191063-A Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate CANON KK 2011-09-21 CN disclosed
EP-2355138-A1 Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate Canon Kabushiki Kaisha (JP) 2011-08-10 EP disclosed
US-20110183448-A1 LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METHOD OF PRODUCING LIQUID DISCHARGE HEAD SUBSTRATE CANON KABUSHIKI KAISHA (JP) 2011-07-28 US disclosed