SCHEMBL21705244

SCHEMBL21705244

O=C(OC1CN2CCC1CC2)c1c(I)ccc(I)c1I

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GLA P06280 1/20 0.57
▸ TSHR P16473 1/20 0.51
▸ RXFP1 Q9HBX9 1/20 0.51
▸ CHRM2 P08172 6/20 0.50
▸ CHRNA7 P36544 5/20 0.50
▸ CHRM1 P11229 4/20 0.50
▸ MEN1 O00255 2/20 0.50
▸ KMT2A Q03164 2/20 0.50
▸ CYP2D6 P10635 1/20 0.50
▸ HTR3E A5X5Y0 1/20 0.50
▸ HTR3B O95264 1/20 0.50
▸ CHRNB2 P17787 1/20 0.50
▸ CHRNA4 P43681 1/20 0.50
▸ HTR3A P46098 1/20 0.50
▸ HTR3D Q70Z44 1/20 0.50
▸ HTR3C Q8WXA8 1/20 0.50
▸ BCHE P06276 1/20 0.50
▸ ACHE P22303 1/20 0.50
▸ CHRM3 P20309 3/20 0.49
▸ NPC1 O15118 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22945419 0.77 CHRNA7 (0.50) GLATSHRRXFP1CHRM2CHRNA7
Benzoclidine SCHEMBL342347 0.75 GLA (0.74) GLATSHRRXFP1CHRM2CHRNA7
Benzoclidine SCHEMBL1542330 0.75 GLA (0.74) GLATSHRRXFP1CHRM2CHRNA7
Benzoclidine SCHEMBL1542430 0.75 GLA (0.74) GLATSHRRXFP1CHRM2CHRNA7
SCHEMBL13470758 0.71 CHRM2 (0.67) GLACHRM2CHRNA7CHRM1MEN1
SCHEMBL16814073 0.71 CHRM2 (0.67) GLACHRM2CHRNA7CHRM1MEN1
SCHEMBL21218778 0.71 CHRNA7 (0.60) GLACHRM2CHRNA7CHRM1MEN1
SCHEMBL21705305 0.71 SCN1A (0.56) CHRM1MEN1KMT2ACHRM3RAB9A
SCHEMBL3743481 0.70 CHRM2 (0.71) GLACHRM2CHRNA7CHRM1MEN1
SCHEMBL26809785 0.70 L3MBTL1 (0.40) MEN1KMT2ACYP2D6CHRNB2CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 — — US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 — — US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR GLA 4629/4885TSHR 969/4885RXFP1 2249/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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