SCHEMBL21705305

SCHEMBL21705305

CN1CCC(OC(=O)c2c(I)ccc(I)c2I)CC1

nearest known ligand 0.62

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
SCN1A P35498 6/20 0.56
SCN2A Q99250 6/20 0.56
SCN3A Q9NY46 6/20 0.56
KMT2A Q03164 2/20 0.56
MEN1 O00255 1/20 0.56
CHRM3 P20309 2/20 0.48
CHRM4 P08173 1/20 0.48
CHRM5 P08912 1/20 0.48
CHRM1 P11229 1/20 0.48
ATM Q13315 1/20 0.47
ALDH1A1 P00352 1/20 0.44
RAB9A P51151 1/20 0.43
MAPT P10636 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807559 0.83 L3MBTL1 (0.57) KMT2AMEN1ATMALDH1A1SMN1; SMN2
SCHEMBL21705229 0.80 HTR4 (0.43) SCN1ASCN2ASCN3AKMT2AMEN1
SCHEMBL21705246 0.79 HTR3A (0.59) KMT2AMEN1
SCHEMBL1839004 0.77 SCN1A (0.75) SCN1ASCN2ASCN3AKMT2AMEN1
SCHEMBL21705308 0.77 TSHR (0.42) SCN1ASCN2ASCN3AKMT2AMEN1
SCHEMBL26809785 0.75 L3MBTL1 (0.40) KMT2AMEN1ATMALDH1A1
SCHEMBL26427856 0.75 ATM (0.53) SCN1ASCN2ASCN3AKMT2AMEN1
SCHEMBL16689994 0.73 SCN1A (0.88) SCN1ASCN2ASCN3AKMT2AMEN1
SCHEMBL1839704 0.73 KMT2A (0.97) SCN1ASCN2ASCN3AKMT2AMEN1
SCHEMBL10306613 0.73 SCN1A (0.88) SCN1ASCN2ASCN3AKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR SCN1A 4040/4885SCN2A 3509/4885SCN3A 3733/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.