SCHEMBL21705285

SCHEMBL21705285

O=C(OCCCN1CCS(=O)(=O)CC1)c1c(I)ccc(I)c1I

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 8/20 0.43
DRD3 P35462 3/20 0.43
CYP2D6 P10635 2/20 0.42
GAA P10253 2/20 0.41
KDM4E B2RXH2 2/20 0.41
PKM P14618 1/20 0.41
SLC29A1 Q99808 4/20 0.38
HPGD P15428 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.36
MEN1 O00255 2/20 0.36
LMNA P02545 2/20 0.36
KMT2A Q03164 2/20 0.36
SLC6A4 P31645 2/20 0.36
ABCC4 O15439 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
TSHR P16473 1/20 0.36
CHRM3 P20309 1/20 0.36
HTR2A P28223 1/20 0.36
MAPK1 P28482 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705232 0.96 HRH3 (0.40) HRH3DRD3CYP2D6GAAKDM4E
SCHEMBL21705921 0.92 HRH3 (0.41) HRH3GAASLC29A1HPGDSMN1; SMN2
SCHEMBL21705286 0.89 CYP2D6 (0.44) HRH3DRD3CYP2D6GAAKDM4E
SCHEMBL21783783 0.82 HRH3 (0.42) HRH3DRD3CYP2D6GAAKDM4E
SCHEMBL26426637 0.78 HRH3 (0.41) HRH3DRD3CYP2D6GAAKDM4E
SCHEMBL21705228 0.78 KMT2A (0.56) CYP2D6KDM4EHPGDMEN1KMT2A
SCHEMBL26426639 0.75 KDM4E (0.41) HRH3DRD3CYP2D6GAAKDM4E
SCHEMBL26426650 0.75 SLC29A1 (0.40) HRH3DRD3CYP2D6GAAKDM4E
SCHEMBL26354608 0.74 KMT2A (0.43) HRH3DRD3CYP2D6GAAKDM4E
SCHEMBL26586803 0.72 ESR1 (0.37) CYP2D6SMN1; SMN2LMNACYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20210033970-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-04 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR HRH3 622/4885DRD3 740/4885CYP2D6 3435/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.