SCHEMBL21705286

SCHEMBL21705286

O=C(OCCCN1CCS(=O)(=O)CC1)c1c(I)ccc(I)c1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.44
GAA P10253 2/20 0.43
KDM4E B2RXH2 1/20 0.43
PKM P14618 1/20 0.43
HRH3 Q9Y5N1 7/20 0.42
DRD3 P35462 3/20 0.42
SLC29A1 Q99808 4/20 0.38
HPGD P15428 1/20 0.37
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
LMNA P02545 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
ABCC4 O15439 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
TSHR P16473 1/20 0.36
CHRM3 P20309 1/20 0.36
HTR2A P28223 1/20 0.36
MAPK1 P28482 1/20 0.36
SLC6A4 P31645 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21783783 0.91 HRH3 (0.42) CYP2D6GAAKDM4EPKMHRH3
SCHEMBL21705285 0.89 HRH3 (0.43) CYP2D6GAAKDM4EPKMHRH3
SCHEMBL21705232 0.85 HRH3 (0.40) CYP2D6GAAKDM4EPKMHRH3
SCHEMBL21705921 0.81 HRH3 (0.41) GAAHRH3SLC29A1HPGDMEN1
SCHEMBL26426639 0.79 KDM4E (0.41) CYP2D6GAAKDM4EPKMHRH3
SCHEMBL26426637 0.75 HRH3 (0.41) CYP2D6GAAKDM4EPKMHRH3
SCHEMBL26354608 0.73 KMT2A (0.43) CYP2D6GAAKDM4EPKMHRH3
SCHEMBL26426650 0.71 SLC29A1 (0.40) CYP2D6GAAKDM4EPKMHRH3
SCHEMBL21705697 0.71 KMT2A (0.51) CYP2D6HRH3DRD3HPGDMEN1
SCHEMBL21705616 0.71 HRH3 (0.39) CYP2D6HRH3SLC29A1HPGDMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20210033970-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-04 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR CYP2D6 3435/4885GAA 4569/4885KDM4E 2329/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.