SCHEMBL21705232

SCHEMBL21705232

O=C(OCCCCN1CCS(=O)(=O)CC1)c1c(I)ccc(I)c1I

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 3/20 0.40
DRD3 P35462 1/20 0.40
SLC29A1 Q99808 2/20 0.39
CYP2D6 P10635 1/20 0.39
KDM4E B2RXH2 1/20 0.38
GAA P10253 1/20 0.38
PKM P14618 1/20 0.38
BCHE P06276 9/20 0.38
TLR7 Q9NYK1 1/20 0.36
HPGD P15428 1/20 0.35
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705285 0.96 HRH3 (0.43) HRH3DRD3SLC29A1CYP2D6KDM4E
SCHEMBL21705921 0.91 HRH3 (0.41) HRH3SLC29A1GAAHPGD
SCHEMBL21705286 0.85 CYP2D6 (0.44) HRH3DRD3SLC29A1CYP2D6KDM4E
SCHEMBL21783783 0.79 HRH3 (0.42) HRH3DRD3SLC29A1CYP2D6KDM4E
SCHEMBL26426650 0.79 SLC29A1 (0.40) HRH3DRD3SLC29A1CYP2D6KDM4E
SCHEMBL21705228 0.77 KMT2A (0.56) CYP2D6KDM4EBCHEHPGD
SCHEMBL26426637 0.75 HRH3 (0.41) HRH3DRD3SLC29A1CYP2D6KDM4E
SCHEMBL26426639 0.71 KDM4E (0.41) HRH3DRD3SLC29A1CYP2D6KDM4E
SCHEMBL26586803 0.71 ESR1 (0.37) CYP2D6RAB9A
SCHEMBL21705697 0.71 KMT2A (0.51) HRH3DRD3CYP2D6HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR HRH3 622/4885DRD3 740/4885SLC29A1 2230/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.