SCHEMBL21705308

SCHEMBL21705308

CN1C(C)(C)CC(OC(=O)c2c(I)ccc(I)c2I)CC1(C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42
GAA P10253 3/20 0.41
HTT P42858 1/20 0.41
KMT2A Q03164 3/20 0.39
ALDH1A1 P00352 2/20 0.38
ESR1 P03372 1/20 0.38
HSD17B10 Q99714 1/20 0.38
CYP2D6 P10635 1/20 0.33
HTR3A P46098 3/20 0.33
LMNA P02545 2/20 0.33
PTPN2 P17706 2/20 0.33
PTPN1 P18031 2/20 0.33
PTPRF P10586 1/20 0.33
MEN1 O00255 2/20 0.32
SCN1A P35498 1/20 0.32
SCN2A Q99250 1/20 0.32
SCN3A Q9NY46 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2C9 P11712 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807612 0.83 ALDH1A1 (0.37) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807649 0.80 ALDH1A1 (0.38) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807600 0.80 ALDH1A1 (0.38) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807587 0.79 PTPN2 (0.57) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL22288733 0.79 TSHR (0.58) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807591 0.78 PTPN2 (0.55) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26427858 0.77 TSHR (0.37) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL21705305 0.77 SCN1A (0.56) KMT2AALDH1A1MEN1SCN1ASCN2A
SCHEMBL21163057 0.77 TSHR (0.41) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807650 0.76 LMNA (0.39) TSHRGAAHTTKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR TSHR 969/4885GAA 4569/4885HTT 196/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.