SCHEMBL21705609

SCHEMBL21705609

O=C(OCCN1CCSCC1)c1cc(I)cc(I)c1O

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.39
MEN1 O00255 2/20 0.39
HPGD P15428 1/20 0.38
ATM Q13315 1/20 0.37
SLC29A1 Q99808 1/20 0.37
GLA P06280 1/20 0.36
CYP3A4 P08684 1/20 0.36
HTR4 Q13639 1/20 0.36
ALDH1A1 P00352 2/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
TSHR P16473 1/20 0.36
THPO P40225 1/20 0.36
LMNA P02545 2/20 0.35
ESR1 P03372 1/20 0.35
PMP22 Q01453 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21783771 0.89 KMT2A (0.39) KMT2AMEN1HPGDATMSLC29A1
SCHEMBL21705608 0.87 KMT2A (0.52) KMT2AMEN1HPGDGLACYP3A4
SCHEMBL21705615 0.86 HRH3 (0.48) KMT2AMEN1HPGDSLC29A1GLA
SCHEMBL21705605 0.85 ATM (0.54) KMT2AHPGDATMALDH1A1CYP1A2
SCHEMBL21705614 0.85 HPGD (0.41) KMT2AMEN1HPGDATMSLC29A1
SCHEMBL21705616 0.84 HRH3 (0.39) KMT2AMEN1HPGDATMSLC29A1
SCHEMBL21705720 0.78 KMT2A (0.52) KMT2AMEN1HPGDALDH1A1CYP1A2
SCHEMBL26426639 0.77 KDM4E (0.41) KMT2AMEN1HPGDSLC29A1CYP3A4
SCHEMBL21705754 0.76 KMT2A (0.50) KMT2AMEN1HPGDSLC29A1GLA
SCHEMBL21705213 0.75 KMT2A (0.52) KMT2AMEN1HPGDGLACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR KMT2A 913/4885MEN1 2260/4885HPGD 4313/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.