SCHEMBL21705616

SCHEMBL21705616

O=C(OCCN1CCS(=O)(=O)CC1)c1cc(I)cc(I)c1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 1/20 0.39
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
HPGD P15428 1/20 0.38
ATM Q13315 1/20 0.36
SLC29A1 Q99808 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
GLA P06280 1/20 0.35
CYP3A4 P08684 1/20 0.35
HTR4 Q13639 1/20 0.35
ALDH1A1 P00352 2/20 0.35
NPSR1 Q6W5P4 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
TSHR P16473 1/20 0.35
THPO P40225 1/20 0.35
LMNA P02545 1/20 0.35
ESR1 P03372 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426639 0.93 KDM4E (0.41) HRH3KMT2AMEN1HPGDSLC29A1
SCHEMBL21783773 0.89 HRH3 (0.39) HRH3KMT2AMEN1HPGDATM
SCHEMBL21705615 0.88 HRH3 (0.48) HRH3KMT2AMEN1HPGDSLC29A1
SCHEMBL21705608 0.86 KMT2A (0.52) KMT2AMEN1HPGDGLACYP3A4
SCHEMBL21705605 0.84 ATM (0.54) KMT2AHPGDATMSMN1; SMN2ALDH1A1
SCHEMBL21705614 0.84 HPGD (0.41) KMT2AMEN1HPGDATMSLC29A1
SCHEMBL21705609 0.84 KMT2A (0.39) KMT2AMEN1HPGDATMSLC29A1
SCHEMBL26426637 0.82 HRH3 (0.41) HRH3KMT2AMEN1HPGDSLC29A1
SCHEMBL26426650 0.81 SLC29A1 (0.40) HRH3KMT2AMEN1SLC29A1SMN1; SMN2
SCHEMBL21705697 0.79 KMT2A (0.51) HRH3KMT2AMEN1HPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR HRH3 622/4885KMT2A 913/4885MEN1 2260/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.