SCHEMBL21705615

SCHEMBL21705615

CN1CCN(CCOC(=O)c2cc(I)cc(I)c2O)CC1

nearest known ligand 0.48

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 4/20 0.48
SLC29A1 Q99808 2/20 0.43
ALDH1A1 P00352 2/20 0.41
DRD3 P35462 1/20 0.41
KMT2A Q03164 3/20 0.39
MEN1 O00255 2/20 0.39
HTR4 Q13639 2/20 0.39
GLA P06280 1/20 0.39
CYP3A4 P08684 1/20 0.39
HPGD P15428 1/20 0.39
ESR1 P03372 1/20 0.39
LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705608 0.88 KMT2A (0.52) ALDH1A1KMT2AMEN1HTR4GLA
SCHEMBL21783772 0.88 HRH3 (0.49) HRH3SLC29A1ALDH1A1DRD3KMT2A
SCHEMBL21705616 0.88 HRH3 (0.39) HRH3SLC29A1ALDH1A1KMT2AMEN1
SCHEMBL21705605 0.86 ATM (0.54) ALDH1A1KMT2AHPGDLMNA
SCHEMBL21705614 0.86 HPGD (0.41) SLC29A1ALDH1A1KMT2AMEN1HTR4
SCHEMBL21705609 0.86 KMT2A (0.39) SLC29A1ALDH1A1KMT2AMEN1HTR4
SCHEMBL26426639 0.81 KDM4E (0.41) HRH3SLC29A1ALDH1A1DRD3KMT2A
SCHEMBL21705754 0.77 KMT2A (0.50) SLC29A1ALDH1A1KMT2AMEN1HTR4
SCHEMBL24361311 0.77 KMT2A (0.50) HRH3ALDH1A1DRD3KMT2AMEN1
SCHEMBL26807538 0.77 ESR1 (0.43) ALDH1A1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR HRH3 622/4885SLC29A1 2230/4885ALDH1A1 4859/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.