SCHEMBL21705754

SCHEMBL21705754

O=C(OCCN1CCCC1)c1cc(I)cc(I)c1I

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.50
HPGD P15428 1/20 0.50
MEN1 O00255 2/20 0.48
GLA P06280 1/20 0.46
CYP3A4 P08684 1/20 0.46
HTR4 Q13639 1/20 0.46
CYP2D6 P10635 3/20 0.46
CYP1A2 P05177 2/20 0.46
TSHR P16473 2/20 0.46
ALDH1A1 P00352 1/20 0.46
CYP2C9 P11712 1/20 0.46
THPO P40225 1/20 0.46
PMP22 Q01453 1/20 0.45
NPSR1 Q6W5P4 1/20 0.43
KDM4E B2RXH2 1/20 0.43
SIGMAR1 Q99720 1/20 0.40
SLC29A1 Q99808 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705213 0.99 KMT2A (0.52) KMT2AHPGDMEN1GLACYP3A4
SCHEMBL21783772 0.89 HRH3 (0.49) KMT2AHPGDGLACYP3A4HTR4
SCHEMBL21705199 0.88 ATM (0.52) KMT2AHPGDCYP1A2ALDH1A1KDM4E
SCHEMBL21783770 0.88 HPGD (0.41) KMT2AHPGDMEN1GLACYP3A4
SCHEMBL21783771 0.88 KMT2A (0.39) KMT2AHPGDMEN1GLACYP3A4
SCHEMBL21783773 0.87 HRH3 (0.39) KMT2AHPGDMEN1GLACYP3A4
SCHEMBL21705608 0.86 KMT2A (0.52) KMT2AHPGDMEN1GLACYP3A4
SCHEMBL24361311 0.85 KMT2A (0.50) KMT2AHPGDMEN1GLACYP3A4
SCHEMBL21705218 0.85 ALDH1A1 (0.46) KMT2AHPGDMEN1GLACYP3A4
SCHEMBL21705227 0.83 HTR4 (0.55) KMT2AHPGDHTR4ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11480875-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-25 US disclosed
US-20210048748-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-18 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR KMT2A 913/4885HPGD 4313/4885MEN1 2260/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.