SCHEMBL21705619

SCHEMBL21705619

NC1CCCC(C(=O)Oc2c(I)cc(I)cc2I)C1

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 2/20 0.39
▸ HTT P42858 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ ULK1 O75385 10/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.35
▸ SMYD3 Q9H7B4 2/20 0.33
▸ POLB P06746 1/20 0.32
▸ KDM1A O60341 1/20 0.31
▸ HPGD P15428 1/20 0.30
▸ MEN1 O00255 1/20 0.30
▸ MAPT P10636 1/20 0.30
▸ PIM1 P11309 1/20 0.30
▸ PIM3 Q86V86 1/20 0.30
▸ PIM2 Q9P1W9 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705618 0.82 KMT2A (0.36) KMT2AHTTSMN1; SMN2TDP1ULK1
SCHEMBL18556770 0.76 HTT (0.40) KMT2AHTTSMN1; SMN2TDP1ULK1
SCHEMBL19678501 0.74 ELANE (0.37) KMT2AHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL21705622 0.74 GABRP (0.38) KMT2AHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL21705617 0.74 POLB (0.31) POLB
SCHEMBL21705623 0.71 SLC6A4 (0.37) KMT2AHTTSMN1; SMN2TDP1POLB
SCHEMBL19678524 0.69 GRM4 (0.38) KMT2AHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL26807723 0.69 POLB (0.32) POLB
SCHEMBL1543565 0.68 SMN1; SMN2 (0.43) SMN1; SMN2ULK1SMYD3POLB
SCHEMBL1543564 0.68 SMN1; SMN2 (0.43) SMN1; SMN2ULK1SMYD3POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 — — US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR KMT2A 913/4885HTT 196/4885SMN1; SMN2 1618/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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