SCHEMBL217366

SCHEMBL217366

[C]1=C(CC2CCCCC2)C=CC1

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HTR3A P46098 1/20 0.34
HRH4 Q9H3N8 1/20 0.34
DAO P14920 1/20 0.33
CEL P19835 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3840225 0.70
SCHEMBL2946521 0.68
SCHEMBL9943425 0.67 HTR3A (0.33) HTR3AHRH4DAOCEL
SCHEMBL7698751 0.64 HTR3A (0.36) HTR3AHRH4DAOCEL
SCHEMBL3693133 0.64 CYP11B2 (0.31)
SCHEMBL1524531 0.63 HRH4 (0.39) HTR3AHRH4DAOCEL
SCHEMBL1524971 0.61 DAO (0.37) HTR3AHRH4DAOCEL
SCHEMBL1524841 0.60 ALDH1A1 (0.40) HTR3AHRH4DAOCEL
SCHEMBL814480 0.60
SCHEMBL7698753 0.60 HRH4 (0.41) HTR3AHRH4DAOCEL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113168093-B Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2024-04-30 CN disclosed
CN-113383273-B Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2023-11-14 CN disclosed
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
CN-113383273-A Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2021-09-10 CN disclosed
CN-113168093-A Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2021-07-23 CN disclosed
US-10421921-B2 Lubricants from mixed alpha-olefin feeds EXXONMOBIL CHEMICAL PATENTS INC. (US) 2019-09-24 US disclosed
EP-1920031-B1 LUBRICANTS FROM MIXED ALPHA-OLEFIN FEEDS EXXONMOBIL CHEMICAL PATENTS INC (US) 2018-01-10 EP disclosed
US-20170137737-A1 Lubricants from Mixed Alpha-Olefin Feeds EXXONMOBIL CHEMICAL PATENTS INC. 2017-05-18 US disclosed
US-9593288-B2 Lubricants from mixed alpha-olefin feeds EXXONMOBIL CHEMICAL PATENTS INC. (US) 2017-03-14 US disclosed
US-9409834-B2 Low viscosity poly-alpha-olefins EXXONMOBIL CHEMICAL PATENTS INC. (US) 2016-08-09 US disclosed
EP-0507876-B1 SUPPORTED IONIC METALLOCENE CATALYSTS FOR OLEFIN POLYMERIZATION EXXON CHEMICAL PATENTS INC (US) 1995-05-17 EP disclosed
US-5407884-A Catalysts, method of preparing these catalysts, and polymerization processes wherein these catalysts are used EXXON CHEMICAL PATENTS INC. (US) 1995-04-18 US disclosed
US-5384299-A Ionic metallocene catalyst compositions EXXON CHEMICAL PATENTS INC. (US) 1995-01-24 US disclosed
EP-0627448-A2 Supported ionic metallocene catalysts for olefin polymerization EXXON CHEMICAL PATENTS INC. (US) 1994-12-07 EP disclosed
WO-1994007927-A1 CATALYST SYSTEM OF ENHANCED PRODUCTIVITY AND ITS USE IN POLYMERIZATION PROCESS EXXON CHEMICAL PATENTS INC. (US) 1994-04-14 WO disclosed
US-5241025-A Catalyst system of enhanced productivity EXXON CHEMICAL PATENTS INC. (US) 1993-08-31 US disclosed
US-5198401-A Ionic metallocene catalyst compositions EXXON CHEMICAL PATENTS INC. (US) 1993-03-30 US disclosed
EP-0513216-A1 BLOCK COPOLYMERS FROM IONIC CATALYSTS. EXXON CHEMICAL PATENTS INC (US) 1992-11-19 EP disclosed
US-5153157-A Catalyst system of enhanced productivity EXXON CHEMICAL PATENTS INC. (US) 1992-10-06 US disclosed
WO-1991012285-A1 BLOCK COPOLYMERS FROM IONIC CATALYSTS EXXON CHEMICAL PATENTS INC. (US) 1991-08-22 WO disclosed