SCHEMBL21749922

SCHEMBL21749922

CCC(C)(SC(=S)c1ccccc1)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC10 Q969S8 1/20 0.41
HDAC11 Q96DB2 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
HDAC6 Q9UBN7 1/20 0.41
HDAC9 Q9UKV0 1/20 0.41
HDAC5 Q9UQL6 1/20 0.41
SMN1; SMN2 Q16637 3/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
EPHX1 P07099 1/20 0.38
CES1 P23141 3/20 0.38
CES2 O00748 2/20 0.38
CYP1A2 P05177 2/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C19 P33261 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19569936 0.87 HDAC3 (0.39) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL29151598 0.80 RIPK1 (0.38) SMN1; SMN2EPHX1POLBALDH1A1TDP1
SCHEMBL25845136 0.79 POLB (0.37) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL822806 0.79 EPHX1 (0.42) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL21382782 0.75 EPHX1 (0.39) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL236901 0.74 ALDH1A1 (0.41) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL13377791 0.74 EPHX1 (0.41) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL164403 0.73 POLB (0.49) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL6721098 0.72 ALDH1A1 (0.50) NPC1RAB9AMEN1KMT2AALDH1A1
SCHEMBL3333743 0.72 MAPT (0.44) HDAC3HDAC4HDAC1HDAC7HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4644354-A1 POLYMER MECHANORADICAL INITIATOR AND REACTION METHOD USING POLYMER MECHANORADICAL INITIATOR National University Corporation Hokkaido University (JP) 2025-11-05 EP disclosed
WO-2025079623-A1 METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079624-A1 METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079622-A1 MICROFLUIDIC SYSTEM, REACTION METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079618-A1 MICROFLUIDIC SYSTEM, REACTION METHOD FOR EMPLOYING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079620-A1 MICROFLUIDIC SYSTEM, PROCESSING METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2024142966-A1 POLYMER MECHANORADICAL INITIATOR AND REACTION METHOD USING POLYMER MECHANORADICAL INITIATOR 国立大学法人北海道大学 2024-07-04 WO disclosed
US-20240084047-A1 METHOD FOR MANUFACTURING POLYMER DAICEL CORPORATION (JP) 2024-03-14 US disclosed
EP-4317204-A1 MANUFACTURING METHOD FOR POLYMER HAVING THIOCARBONYLTHIO GROUP REMOVED FUJIFILM Corporation (JP) 2024-02-07 EP disclosed
EP-4317197-A1 METHOD FOR PRODUCING POLYMER BY REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSFER POLYMERIZATION FUJIFILM Corporation (JP) 2024-02-07 EP disclosed
US-11859028-B2 Method for manufacturing polymer DAICEL CORPORATION (JP) 2024-01-02 US disclosed
US-20230391898-A1 METHOD FOR PRODUCING THIOCARBONYLTHIO GROUP-REMOVED POLYMER FUJIFILM CORPORATION (JP) 2023-12-07 US disclosed
US-20230391896-A1 METHOD FOR PRODUCING REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSFER POLYMERIZATION POLYMER FUJIFILM CORPORATION (JP) 2023-12-07 US disclosed
WO-2022210253-A1 METHOD FOR PRODUCING POLYMER BY REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSFER POLYMERIZATION 富士フイルム株式会社 2022-10-06 WO disclosed
WO-2022210254-A1 MANUFACTURING METHOD FOR POLYMER HAVING THIOCARBONYLTHIO GROUP REMOVED 富士フイルム株式会社 2022-10-06 WO disclosed
US-11434308-B2 Method for manufacturing polymer DAICEL CORPORATION (JP) 2022-09-06 US disclosed
US-20220259335-A1 METHOD FOR MANUFACTURING POLYMER DAICEL CORPORATION (JP) 2022-08-18 US disclosed
US-20210040253-A1 PHOTORESIST RESIN, PRODUCTION METHOD FOR PHOTORESIST RESIN, PHOTORESIST RESIN COMPOSITION, AND PATTERN FORMATION METHOD DAICEL CORPORATION (JP) 2021-02-11 US disclosed
US-20200062870-A1 METHOD FOR MANUFACTURING POLYMER DAICEL CORPORATION (JP) 2020-02-27 US disclosed