SCHEMBL6721098

SCHEMBL6721098

CC(C)(C)SC(=S)c1ccc(C(=O)c2ccccc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.50
SRD5A2 P31213 2/20 0.48
ELANE P08246 5/20 0.47
RAB9A P51151 2/20 0.46
HPGD P15428 2/20 0.46
NPC1 O15118 1/20 0.46
L3MBTL1 Q9Y468 2/20 0.44
ATM Q13315 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
LMNA P02545 1/20 0.43
MAPT P10636 1/20 0.43
MAPK13 O15264 1/20 0.43
MAPK12 P53778 1/20 0.43
MAPK11 Q15759 1/20 0.43
MAPK14 Q16539 1/20 0.43
ABCC9 O60706 2/20 0.42
ABCC8 Q09428 2/20 0.42
KCNJ11 Q14654 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL236901 0.89 ALDH1A1 (0.41) ALDH1A1RAB9AHPGDNPC1L3MBTL1
SCHEMBL6721030 0.85 ALDH1A1 (0.45) ALDH1A1SRD5A2ELANERAB9AHPGD
SCHEMBL6721066 0.81 SMN1; SMN2 (0.44) ALDH1A1RAB9AHPGDNPC1L3MBTL1
SCHEMBL16300519 0.79 ALDH1A1 (0.56) ALDH1A1SRD5A2ELANERAB9AHPGD
SCHEMBL6721095 0.79 MAPT (0.53) ALDH1A1ELANEL3MBTL1TDP1MEN1
SCHEMBL822806 0.78 EPHX1 (0.42) ALDH1A1ELANERAB9ANPC1TDP1
SCHEMBL6721100 0.77 PARP10 (0.44) ALDH1A1SRD5A2RAB9AHPGDNPC1
SCHEMBL13377791 0.76 EPHX1 (0.41) ALDH1A1RAB9AHPGDNPC1TDP1
SCHEMBL3333743 0.75 MAPT (0.44) ALDH1A1RAB9ANPC1L3MBTL1ATM
Benzophenone SCHEMBL28321860 0.74 ALDH1A1 (0.74) ALDH1A1SRD5A2ELANERAB9AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed