SCHEMBL21774692

SCHEMBL21774692

Cc1ccc(C(c2cc(C)c(OC(=O)OC(C)(C)C)c(C)c2)c2cc(C)c(OC(=O)OC(C)(C)C)c(C)c2)cc1

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.39
PPARG P37231 1/20 0.35
PPARD Q03181 1/20 0.35
PPARA Q07869 1/20 0.35
L3MBTL1 Q9Y468 2/20 0.32
NPC1 O15118 1/20 0.31
ALDH1A1 P00352 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
CNR1 P21554 1/20 0.31
LMNA P02545 1/20 0.31
GPR119 Q8TDV5 1/20 0.31
CA2 P00918 1/20 0.30
KDM1A O60341 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8015384 0.96 ELANE (0.41) ELANEPPARGPPARDPPARAL3MBTL1
SCHEMBL21775769 0.95 ELANE (0.35) ELANEPPARGPPARDPPARAL3MBTL1
SCHEMBL23627363 0.89 ELANE (0.37) ELANEL3MBTL1
SCHEMBL23627432 0.84 ELANE (0.34) ELANE
SCHEMBL17171699 0.80 ELANE (0.44) ELANEL3MBTL1ALDH1A1NPSR1CA2
SCHEMBL21775757 0.80 CNR1 (0.42) L3MBTL1NPC1ALDH1A1SMN1; SMN2NPSR1
SCHEMBL9173831 0.78 ELANE (0.38) ELANEPPARGPPARDPPARAL3MBTL1
SCHEMBL21775768 0.75 TGM2 (0.35) PPARGPPARDPPARAL3MBTL1NPC1
SCHEMBL197179 0.75 ELANE (0.66) ELANEL3MBTL1NPSR1LMNACA2
SCHEMBL17546512 0.75 ELANE (0.43) ELANEALDH1A1RAB9ALMNACA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-07-08 US disclosed
WO-2020040161-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF ELANE 3162/4885PPARG 1065/4885PPARD 2790/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.