Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | PPARG | P37231 | 1/20 | 0.33 |
| ▸ | PPARD | Q03181 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.32 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | G6PD | P11413 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | KDM1A | O60341 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21774692 | 0.95 | ELANE (0.39) | ELANEALDH1A1MAPTPPARGPPARD | |
| SCHEMBL8015384 | 0.91 | ELANE (0.41) | ELANEPPARGPPARDPPARAL3MBTL1 | |
| SCHEMBL23627432 | 0.90 | ELANE (0.34) | ELANE | |
| SCHEMBL23627363 | 0.84 | ELANE (0.37) | ELANEL3MBTL1 | |
| SCHEMBL21241774 | 0.77 | PTGS1 (0.48) | ALDH1A1MAPTMEN1KMT2AALOX5 | |
| SCHEMBL17171699 | 0.75 | ELANE (0.44) | ELANEALDH1A1MAPTL3MBTL1CA2 | |
| SCHEMBL21775757 | 0.75 | CNR1 (0.42) | ALDH1A1MAPTMEN1KMT2AGAA | |
| SCHEMBL14478025 | 0.75 | ELANE (0.32) | ELANE | |
| SCHEMBL21775908 | 0.74 | TTR (0.33) | ELANE | |
| SCHEMBL9173831 | 0.74 | ELANE (0.38) | ELANEPPARGPPARDPPARAL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020040161-A1 | COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM | 三菱瓦斯化学株式会社 | 2020-02-27 | — | — | WO | disclosed |