SCHEMBL8015384

SCHEMBL8015384

Cc1cc(C(c2ccc(C(c3cc(C)c(OC(=O)OC(C)(C)C)c(C)c3)c3cc(C)c(OC(=O)OC(C)(C)C)c(C)c3)cc2)c2cc(C)c(OC(=O)OC(C)(C)C)c(C)c2)cc(C)c1OC(=O)OC(C)(C)C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.33
CA2 P00918 1/20 0.32
KDM1A O60341 1/20 0.32
PPARA Q07869 3/20 0.31
CNR1 P21554 3/20 0.31
APP P05067 1/20 0.31
KDM4E B2RXH2 1/20 0.30
ABCB11 O95342 1/20 0.30
LMNA P02545 1/20 0.30
ESR1 P03372 1/20 0.30
CYP3A4 P08684 1/20 0.30
ADRA2A P08913 1/20 0.30
CYP2C9 P11712 1/20 0.30
TSHR P16473 1/20 0.30
PDE4A P27815 1/20 0.30
ADRA1A P35348 1/20 0.30
OPRK1 P41145 1/20 0.30
STAT6 P42226 1/20 0.30
SLC6A3 Q01959 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21774692 0.96 ELANE (0.39) ELANEL3MBTL1CA2KDM1APPARA
SCHEMBL23627363 0.93 ELANE (0.37) ELANEL3MBTL1
SCHEMBL21775769 0.91 ELANE (0.35) ELANEL3MBTL1CA2KDM1APPARA
SCHEMBL23627432 0.88 ELANE (0.34) ELANE
SCHEMBL9173831 0.81 ELANE (0.38) ELANEL3MBTL1PPARAPPARGPPARD
SCHEMBL17171699 0.80 ELANE (0.44) ELANEL3MBTL1CA2KDM1AKDM4E
SCHEMBL197179 0.78 ELANE (0.66) ELANEL3MBTL1CA2KDM1AKDM4E
SCHEMBL17546512 0.78 ELANE (0.43) ELANECA2KDM1ALMNATSHR
SCHEMBL12257146 0.77 ELANE (0.42) ELANECA2KDM1ACYP2C9TSHR
SCHEMBL21775908 0.76 TTR (0.33) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6030746-A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-29 US disclosed