SCHEMBL21775908

SCHEMBL21775908

Cc1cc(C(c2cc(C)c(OC(=O)OC(C)(C)C)c(C)c2)c2cc(I)cc(I)c2O)cc(C)c1OC(=O)OC(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.33
ELANE P08246 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21775907 0.83 KDM4E (0.34) TTR
SCHEMBL21775906 0.82
SCHEMBL23627432 0.80 ELANE (0.34) ELANE
SCHEMBL23627363 0.79 ELANE (0.37) ELANE
SCHEMBL23627362 0.79 ELANE (0.31) ELANE
SCHEMBL27255623 0.78 ELANE (0.39) TTRELANE
SCHEMBL8015384 0.76 ELANE (0.41) ELANE
SCHEMBL21241704 0.76 TTR (0.50) TTR
SCHEMBL27280348 0.74 ELANE (0.43) TTRELANE
SCHEMBL21775769 0.74 ELANE (0.35) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-07-08 US disclosed
WO-2020040161-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF TTR 3861/4885ELANE 3162/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.