SCHEMBL21786246

SCHEMBL21786246

CC(=O)Oc1ccc2cc(C(=O)OC(CS(=O)(=O)O)(C(F)(F)F)C(F)(F)F)ccc2c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A1 P04798 1/20 0.38
CYP1B1 Q16678 1/20 0.38
CA12 O43570 2/20 0.37
CA9 Q16790 2/20 0.37
CA2 P00918 7/20 0.37
FTO Q9C0B1 1/20 0.36
KDM4E B2RXH2 3/20 0.35
POLB P06746 2/20 0.35
GLA P06280 2/20 0.35
GAA P10253 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CA5A P35218 1/20 0.35
HGFAC Q04756 1/20 0.35
MAPT P10636 2/20 0.35
PKM P14618 1/20 0.35
MEN1 O00255 1/20 0.35
LMNA P02545 1/20 0.35
TTR P02766 1/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18470390 0.89 ELANE (0.38) CYP1A1CYP1B1CA2FTOKDM4E
SCHEMBL18470387 0.87 FTO (0.34) FTOKDM4EGAATDP1HGFAC
SCHEMBL21786209 0.87 MAPT (0.41) TDP1MAPTMEN1LMNATP53
SCHEMBL20332654 0.84 CYP2A6 (0.39) CA2KDM4EPOLBMEN1TP53
SCHEMBL13079573 0.84 CES2 (0.41) KDM4EGAATDP1MAPTLMNA
SCHEMBL25476320 0.81 TSHR (0.34) CYP1A1CYP1B1KDM4EGAAALDH1A1
SCHEMBL19756148 0.81 TSHR (0.35) KDM4EGAAMAPTPKMMEN1
SCHEMBL18470400 0.79 TDP1 (0.31) KDM4ETDP1MAPTPKMMEN1
SCHEMBL20799733 0.79
SCHEMBL24453071 0.78 ALDH1A1 (0.40) KDM4EGAATDP1MAPTPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11124477-B2 Sulfonium compound, positive resist composition, and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-21 US disclosed
US-20200071268-A1 SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11124477-B2 Sulfonium compound, positive resist composition, and resist pattern forming process H1-4, H1-0, SLC11A2 CYP1A1 3121/4885CYP1B1 3337/4885CA12 1756/4885
US-20200071268-A1 SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS H1-4, H1-0, SLC11A2 CYP1A1 3121/4885CYP1B1 3337/4885CA12 1756/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.