SCHEMBL21786249

SCHEMBL21786249

Cc1ccc(S(=O)(=O)Nc2ccccc2Sc2ccccc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.60
ALDH1A1 P00352 3/20 0.60
CYP2C9 P11712 3/20 0.60
CYP2C19 P33261 3/20 0.60
POLB P06746 2/20 0.60
L3MBTL1 Q9Y468 2/20 0.60
SMN1; SMN2 Q16637 2/20 0.60
USP2 O75604 1/20 0.60
MAPT P10636 1/20 0.60
NOD2 Q9HC29 1/20 0.60
CA2 P00918 3/20 0.58
CA9 Q16790 3/20 0.58
CA12 O43570 2/20 0.58
MCOLN3 Q8TDD5 1/20 0.58
KEAP1 Q14145 1/20 0.56
NFE2L2 Q16236 1/20 0.56
CA1 P00915 2/20 0.56
CA4 P22748 1/20 0.56
CA7 P43166 1/20 0.56
CYP1A2 P05177 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8993697 0.84 ALDH1A1 (0.78) LMNAALDH1A1CYP2C9CYP2C19POLB
SCHEMBL8993799 0.83 ALDH1A1 (0.76) LMNAALDH1A1CYP2C9CYP2C19POLB
SCHEMBL2903472 0.83 ALDH1A1 (0.54) ALDH1A1CYP2C9CYP2C19POLBL3MBTL1
SCHEMBL11785265 0.81 LMNA (0.77) LMNAALDH1A1CYP2C9CYP2C19POLB
SCHEMBL3756565 0.81 POLB (0.57) LMNAALDH1A1CYP2C9CYP2C19POLB
SCHEMBL7674914 0.81 ALDH1A1 (0.59) LMNAALDH1A1SMN1; SMN2NOD2TSHR
SCHEMBL2068526 0.81 LMNA (0.82) LMNAALDH1A1CYP2C9CYP2C19POLB
SCHEMBL10899524 0.79 CDK2 (0.56) LMNAALDH1A1CYP2C9CYP2C19POLB
SCHEMBL13509685 0.79 MCL1 (0.71) ALDH1A1POLBL3MBTL1SMN1; SMN2MAPT
SCHEMBL5955467 0.79 MAPT (0.55) LMNAALDH1A1CYP2C9CYP2C19POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11124477-B2 Sulfonium compound, positive resist composition, and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-21 US disclosed
US-20200071268-A1 SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11124477-B2 Sulfonium compound, positive resist composition, and resist pattern forming process H1-4, H1-0, SLC11A2 LMNA 1916/4885ALDH1A1 4602/4885CYP2C9 4330/4885
US-20200071268-A1 SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS H1-4, H1-0, SLC11A2 LMNA 1916/4885ALDH1A1 4602/4885CYP2C9 4330/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.