⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1375632 | 0.77 | DAO (0.35) | — | |
| SCHEMBL31722305 | 0.75 | — | — | |
| SCHEMBL31722380 | 0.75 | HDAC8 (0.32) | — | |
| SCHEMBL5701122 | 0.75 | NR1H2 (0.31) | — | |
| SCHEMBL7169327 | 0.74 | TAAR1 (0.32) | — | |
| SCHEMBL19973316 | 0.74 | — | — | |
| SCHEMBL4966261 | 0.72 | AURKA (0.37) | — | |
| SCHEMBL3796424 | 0.72 | — | — | |
| SCHEMBL28399974 | 0.72 | DAO (0.32) | — | |
| SCHEMBL22589131 | 0.72 | MAOA (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 157 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12588435-B2 | Selective inhibition for selective metal deposition | TOKYO ELECTRON LIMITED (JP) | 2026-03-24 | — | — | US | claimed |
| US-20250379101-A1 | SURFACE PASSIVATION FOR ACHIEVING CONTROLLABLE QUEUE TIME FOR POST-PLANARIZATION PROCESS | TOKYO ELECTRON LTD (JP) | 2025-12-11 | — | — | US | claimed |
| US-12435416-B2 | Compositions and methods using same for non-conformal deposition of silicon containing films | VERSUM MATERIALS US, LLC (US) | 2025-10-07 | — | — | US | claimed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| CN-119900018-A | Composition for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2025-04-29 | — | — | CN | claimed |
| US-20240213093-A1 | CATALYST-ENHANCED CHEMICAL VAPOR DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2024-06-27 | — | — | US | claimed |
| WO-2024137050-A1 | CATALYST-ENHANCED CHEMICAL VAPOR DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2024-06-27 | — | — | WO | claimed |
| US-20230274932-A1 | SELECTIVE INHIBITION FOR SELECTIVE METAL DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2023-08-31 | — | — | US | claimed |
| WO-2023164685-A1 | SELECTIVE INHIBITION FOR SELECTIVE METAL DEPOSITION | TOKYO ELECTRON LIMITED (JP) | 2023-08-31 | — | — | WO | claimed |
| US-11621190-B2 | Method for filling recessed features in semiconductor devices with a low-resistivity metal | TOKYO ELECTRON LIMITED (JP) | 2023-04-04 | — | — | US | claimed |
| US-10242864-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2019-03-26 | — | — | US | claimed |
| US-10014213-B2 | Selective bottom-up metal feature filling for interconnects | TOKYO ELECTRON LIMITED (JP) | 2018-07-03 | — | — | US | claimed |
| US-20180012752-A1 | METHOD AND APPARATUS FOR SELECTIVE FILM DEPOSITION USING A CYCLIC TREATMENT | TOKYO ELECTRON LIMITED (JP) | 2018-01-11 | — | — | US | claimed |
| US-20170110368-A1 | SELECTIVE BOTTOM-UP METAL FEATURE FILLING FOR INTERCONNECTS | TOKYO ELECTRON LIMITED (JP) | 2017-04-20 | — | — | US | claimed |
| US-9460912-B2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-04 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| CN-103374708-A | High temperature atomic layer deposition of silicon oxide thin films | AIR PROD & CHEM | 2013-10-30 | — | — | CN | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| EP-0029001-B1 | ALPHA-PHENOXY-PROPIONYL AZOLES, THEIR PREPARATION, HERBICIDAL AGENTS CONTAINING THEM AND THEIR USE | CIBA-GEIGY AG (CH) | 1984-03-21 | — | — | EP | claimed |
| EP-0023286-B1 | AZOLYL-ALKENOLS, PROCESS FOR THEIR PREPARATION AND THEIR USE AS FUNGICIDES | BAYER AG (DE) | 1983-04-13 | — | — | EP | claimed |