SCHEMBL218020

SCHEMBL218020

Cc1ccc(O)c(C(O)O)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.54
TP53 P04637 2/20 0.52
TDP1 Q9NUW8 2/20 0.52
LMNA P02545 5/20 0.50
CHRM1 P11229 3/20 0.50
ADRA1A P35348 2/20 0.50
SLC6A2 P23975 1/20 0.50
HTR2B P41595 1/20 0.50
ALOX15 P16050 2/20 0.48
HSD17B10 Q99714 2/20 0.48
ALDH1A1 P00352 2/20 0.48
MAPT P10636 3/20 0.46
HPGD P15428 3/20 0.46
KMT2A Q03164 3/20 0.46
MEN1 O00255 2/20 0.46
GAA P10253 2/20 0.46
ALOX12 P18054 1/20 0.46
CSNK2A1 P68400 1/20 0.43
CHRM2 P08172 2/20 0.42
CHRM5 P08912 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30631004 1.00 TRPA1 (0.54) TRPA1TP53TDP1LMNACHRM1
SCHEMBL27562673 0.86 TRPA1 (0.54) TRPA1TP53TDP1LMNACHRM1
SCHEMBL7040989 0.85 TP53 (0.48) TRPA1TP53TDP1LMNACHRM1
SCHEMBL7758863 0.84 LMNA (0.54) TRPA1TP53TDP1LMNACHRM1
SCHEMBL13257345 0.83 TRPA1 (0.56) TRPA1TP53TDP1LMNACHRM1
Isothymol SCHEMBL852892 0.81 LMNA (0.68) TRPA1TP53TDP1LMNACHRM1
SCHEMBL9194021 0.81 TRPA1 (0.68) TRPA1TP53TDP1LMNACHRM1
SCHEMBL50784 0.81 LMNA (0.56) TRPA1TP53TDP1LMNACHRM1
SCHEMBL9839346 0.80 TRPA1 (0.48) TRPA1TP53TDP1LMNACHRM1
SCHEMBL5596907 0.79 TRPA1 (0.52) TRPA1TP53TDP1LMNACHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 740 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117645771-A Solvent-free high-low temperature resistant bulletproof composite matrix resin and preparation method thereof 上海鑫丰泰新材料科技有限公司 2024-03-05 CN claimed
CN-117342932-A Preparation method of 2,6-bis (2, 4-dihydroxybenzyl) -4-methylphenol 沈阳化工研究院有限公司 2024-01-05 CN claimed
US-11520083-B2 Member, imaging apparatus, and method for producing member CANON KABUSHIKI KAISHA (JP) 2022-12-06 US claimed
CN-106631730-A Preparation method and application of bis-schiff base based fluorescent sensing material 江苏大学 2017-05-10 CN claimed
CN-104529861-A Method for synthesizing imide group modified low-molecular-weight line-type phenolic resin and sensitization imaging composition containing imide group modified low-molecular-weight line-type phenolic resin WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD 2015-04-22 CN claimed
CN-104402751-A Photosensitive imaging composition of amide phenol-containing compound or oligomer thereof WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD 2015-03-11 CN claimed
CN-102838453-A Method to prepare phenolic organic mixture preparation by means of catalytic pyrolysis of biomass through coke UNIV NORTH CHINA ELEC POWER 2012-12-26 CN claimed
CN-101597219-A The active etherate of phenolic compound and preparation thereof WEIHAI ECONOMY & TECHNOLOGY ZO (CN) 2009-12-09 CN claimed
US-5576139-A EXCELLENT RESOLUTION, SENSITIVITY, HEAT RESISTANCE AND DEVELOPABILITY FUJI PHOTO FILM CO., LTD. (JP) 1996-11-19 US claimed
US-4387152-A Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material HOECHST AKTIENGESELLSCHAFT (DE) 1983-06-07 US claimed
JP-9136850-A None JP disclosed
WO-2026105628-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 日産化学株式会社 2026-05-21 WO disclosed
WO-2026105630-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 日産化学株式会社 2026-05-21 WO disclosed
US-12631965-B2 Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film ECHEM SOLUTIONS CORP. (TW) 2026-05-19 US disclosed
US-20260118765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2026-04-30 US disclosed
US-4387152-A Light-sensitive mixture and copying material prepared therefrom, and process for the preparation of a printing form from the copying material HOECHST AKTIENGESELLSCHAFT (DE) 1983-06-07 US disclosed
US-4358616-A REACTING A HYDROXY-SUBSTITUTED BENZYL ALCOHOL WITH AN ACYCLIC OR CARBO MERCAPTAN; NONCATALYTIC REACTION BAYER AKTIENGESELLSCHAFT (DE) 1982-11-09 US disclosed
EP-0050802-A2 Light-sensitive composition, light-sensitive copying material made therefrom, and process for producing a printing forme from this material HOECHST AKTIENGESELLSCHAFT (DE) 1982-05-05 EP disclosed
EP-0011091-B1 PROCESS FOR PREPARING ALKYL- OR ARYLTHIOMETHYL-PHENOLS BAYER AG (DE) 1981-07-15 EP disclosed
EP-0011091-A1 Process for preparing alkyl- or arylthiomethyl-phenols BAYER AG (DE) 1980-05-28 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12631965-B2 Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film PAH, POLR1A, CBR1 TRPA1 402/4885TP53 4496/4885TDP1 1159/4885
US-20260118765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION ASH2L, ASIC1, RPA1 TRPA1 2405/4885TP53 4776/4885TDP1 349/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.