⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2182016 | 0.88 | — | — | |
| SCHEMBL525456 | 0.86 | ALDH1A1 (0.32) | — | |
| SCHEMBL2677369 | 0.83 | ALDH1A1 (0.33) | — | |
| SCHEMBL1634457 | 0.81 | — | — | |
| SCHEMBL1635652 | 0.78 | SCN9A (0.32) | — | |
| SCHEMBL2677501 | 0.78 | SCN9A (0.31) | — | |
| SCHEMBL1146840 | 0.76 | HSD11B1 (0.32) | — | |
| SCHEMBL242790 | 0.76 | P2RX7 (0.36) | — | |
| SCHEMBL546526 | 0.73 | — | — | |
| SCHEMBL1635918 | 0.72 | TSHR (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8378016-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20110165519-A1 | RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME | ANDO NOBUO | 2011-07-07 | — | — | US | disclosed |
| US-20070149702-A1 | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-06-28 | — | — | US | disclosed |