Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TGFBR1 | P36897 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL8850985 | 0.83 | TGFBR1 (0.34) | TGFBR1TSHRTET2ALDH1A1TDP1 | |
| Methacrylic Acid SCHEMBL11120673 | 0.82 | TRPA1 (0.38) | TGFBR1TSHRTET2PTGS1KCNH2 | |
| Methacrylic Acid SCHEMBL9147600 | 0.82 | TRPA1 (0.38) | TGFBR1TSHRTET2PTGS1KCNH2 | |
| Methacrylic Acid SCHEMBL347451 | 0.82 | TRPA1 (0.38) | TGFBR1TSHRTET2PTGS1KCNH2 | |
| Methacrylic Acid SCHEMBL28135989 | 0.80 | TGFBR1 (0.35) | TGFBR1TSHRTET2ALDH1A1TDP1 | |
| Methacrylic Acid SCHEMBL8850937 | 0.80 | TGFBR1 (0.39) | TGFBR1TSHRTET2ALDH1A1TDP1 | |
| 2,2,3-Trimethylbutane SCHEMBL998330 | 0.79 | SLC7A5 (0.38) | TGFBR1TSHRTET2ALDH1A1TDP1 | |
| 2,2,3-Trimethylbutane SCHEMBL27799314 | 0.79 | SLC7A5 (0.38) | TGFBR1TSHRTET2ALDH1A1TDP1 | |
| Methacrylic Acid SCHEMBL3802187 | 0.79 | TET2 (0.39) | TGFBR1TSHRTET2ALDH1A1TDP1 | |
| SCHEMBL6343065 | 0.78 | TSHR (0.35) | TSHRALDH1A1TDP1PTGS1KCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020071204-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED PRODUCT, CURED PRODUCT, INTERLAYER INSULATING FILM, COVER COAT LAYER, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | 日立化成デュポンマイクロシステムズ株式会社 | 2020-04-09 | — | — | WO | disclosed |