Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | G6PD | P11413 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | CCR6 | P51684 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | ESR1 | P03372 | 3/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30062005 | 1.00 | ALDH1A1 (0.37) | ALDH1A1CYP3A4MAPK1KDM4ECYP1A2 | |
| SCHEMBL12190600 | 0.98 | KDM4E (0.35) | ALDH1A1CYP3A4MAPK1KDM4ECYP1A2 | |
| SCHEMBL14413579 | 0.98 | KDM4E (0.35) | ALDH1A1CYP3A4MAPK1KDM4ECYP1A2 | |
| SCHEMBL12387988 | 0.98 | KDM4E (0.35) | ALDH1A1CYP3A4MAPK1KDM4ECYP1A2 | |
| SCHEMBL17789211 | 0.90 | ALDH1A1 (0.32) | ALDH1A1CYP3A4MAPK1KDM4ECYP1A2 | |
| SCHEMBL196263 | 0.87 | RXRA (0.35) | ALDH1A1CYP3A4KDM4ECYP1A2MAPT | |
| SCHEMBL29569404 | 0.87 | RXRA (0.35) | ALDH1A1CYP3A4KDM4ECYP1A2MAPT | |
| SCHEMBL6224470 | 0.81 | RXRA (0.46) | ALDH1A1CYP3A4MAPK1KDM4ECYP1A2 | |
| SCHEMBL4460568 | 0.78 | RARG (0.35) | RXRARARBRARARARGFTO | |
| SCHEMBL4460410 | 0.78 | FTO (0.51) | ALDH1A1CYP3A4HPGDHSD17B10RXRA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 212 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1567577-B1 | METHOD FOR MAKING STABLE, HOMOGENEOUS MELT SOLUTIONS | GEN ELECTRIC (US) | 2008-05-21 | — | — | EP | claimed |
| US-7303855-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | claimed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | claimed |
| US-6900283-B2 | Method for making stable, homogeneous melt solutions | GENERAL ELECTRIC COMPANY (US) | 2005-05-31 | — | — | US | claimed |
| US-20040087756-A1 | METHOD FOR MAKING STABLE, HOMOGENEOUS MELT SOLUTIONS | GENERAL ELECTRIC COMPANY | 2004-05-06 | — | — | US | claimed |
| EP-1165652-B1 | POLYCARBONATES SIUTABLE FOR USE IN OPTICAL ARTICLES | GEN ELECTRIC (US) | 2003-12-10 | — | — | EP | claimed |
| US-20240242967-A1 | Polymer For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-4398037-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-12032293-B2 | Composition for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| EP-4390547-A1 | POLYMER FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3835380-B1 | MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2024-04-24 | — | — | EP | disclosed |
| EP-3876035-B1 | COATING-TYPE COMPOSITION FOR FORMING ORIGINAL FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER | SHINETSU CHEMICAL CO (JP) | 2024-04-17 | — | — | EP | disclosed |
| EP-3764162-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHINETSU CHEMICAL CO (JP) | 2024-04-17 | — | — | EP | disclosed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | disclosed |
| US-6900283-B2 | Method for making stable, homogeneous melt solutions | GENERAL ELECTRIC COMPANY (US) | 2005-05-31 | — | — | US | disclosed |
| US-20040087756-A1 | METHOD FOR MAKING STABLE, HOMOGENEOUS MELT SOLUTIONS | GENERAL ELECTRIC COMPANY | 2004-05-06 | — | — | US | disclosed |
| US-6080522-A | CONTAINING PHOTORESIST AND POLYMER | CLARIANT INTERNAITONAL, LTD. (CH) | 2000-06-27 | — | — | US | disclosed |
| US-6028161-A | EXCELLENT TRANSPARENCY, HEAT RESISTANCE AND MECHANICAL PROPERTIES AND A LOW BIREFRINGENCE, MELT FLUIDITY AND MOLDABILITY; AN OPTICAL DISK, LENS AND AN OPTICAL FIBER | MITSUI CHEMICALS, INC. (JP) | 2000-02-22 | — | — | US | disclosed |
| EP-0926180-A2 | A polycarbonate copolymer and applications thereof | Mitsui Chemicals, Inc. (JP) | 1999-06-30 | — | — | EP | disclosed |
| EP-0922998-A1 | RADIATION-SENSITIVE RESIST COMPOSITION WITH HIGH HEAT RESISTANCE | Clariant International Ltd. (CH) | 1999-06-16 | — | — | EP | disclosed |