Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 9/20 | 0.39 |
| ▸ | CA1 | P00915 | 8/20 | 0.39 |
| ▸ | MMP1 | P03956 | 6/20 | 0.39 |
| ▸ | MMP2 | P08253 | 6/20 | 0.39 |
| ▸ | MMP9 | P14780 | 6/20 | 0.39 |
| ▸ | MMP8 | P22894 | 6/20 | 0.39 |
| ▸ | MMP13 | P45452 | 6/20 | 0.39 |
| ▸ | F2 | P00734 | 4/20 | 0.36 |
| ▸ | PRSS1 | P07477 | 4/20 | 0.36 |
| ▸ | PRSS2 | P07478 | 4/20 | 0.36 |
| ▸ | PRSS3 | P35030 | 4/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyridine SCHEMBL11671525 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL19811111 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL19811051 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL19811340 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL19810912 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL19811612 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL19810963 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL18008585 | 0.98 | CA2 (0.41) | CA2CA1MMP1MMP2MMP9 | |
| Pyridine SCHEMBL8432532 | 0.94 | NAPRT (0.36) | CA2CA1MMP1MMP2MMP9 | |
| Pyrimidine SCHEMBL18788536 | 0.89 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250216782-A1 | MASKING PROCESS USING SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | claimed |
| CN-118251759-A | Multi-level selective patterning for stacked device creation | 杰米纳蒂奥公司 | 2024-06-25 | — | — | CN | claimed |
| CN-118215986-A | Chemoselective adhesion and strength promoters in semiconductor patterning | 杰米纳蒂奥公司 | 2024-06-18 | — | — | CN | claimed |
| CN-117941028-A | Self-aligned stacking method | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117941029-A | Self-aligned high-order patterning based on anti-spacer | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117916851-A | Enhanced field stitching with corrective chemistry | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117916852-A | Assist feature placement in semiconductor patterning | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117916854-A | Narrow line cutting mask method | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117916855-A | In-resist process for forming high density contacts | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117916853-A | Formation of a multi-line etched substrate | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117916668-A | Optimization for localized chemical exposure | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | claimed |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675357-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| EP-4610254-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2025-09-03 | — | — | EP | disclosed |
| US-20070122740-A1 | Resist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20060234158-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060204891-A1 | Etching resistance; novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-09-14 | — | — | US | disclosed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20060014106-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-01-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | CA2 291/4885CA1 29/4885MMP1 744/4885 |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | CBR3, CBR1, NOTUM | CA2 1035/4885CA1 467/4885MMP1 3188/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.