Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.68 |
| ▸ | AMY1A | P0DUB6 | 8/20 | 0.59 |
| ▸ | MAPT | P10636 | 4/20 | 0.55 |
| ▸ | NPC1 | O15118 | 2/20 | 0.55 |
| ▸ | RAB9A | P51151 | 2/20 | 0.55 |
| ▸ | LMNA | P02545 | 1/20 | 0.55 |
| ▸ | HPGD | P15428 | 1/20 | 0.55 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.55 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.55 |
| ▸ | RELA | Q04206 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.51 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | BRD4 | O60885 | 1/20 | 0.41 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.41 |
| ▸ | MB | P02144 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL108928 | 0.81 | THRB (1.00) | THRBAMY1AMAPTNPC1RAB9A | |
| SCHEMBL29374972 | 0.81 | THRB (1.00) | THRBAMY1AMAPTNPC1RAB9A | |
| SCHEMBL108929 | 0.81 | THRB (1.00) | THRBAMY1AMAPTNPC1RAB9A | |
| SCHEMBL31531725 | 0.79 | FTO (0.55) | THRBMAPTNPC1RAB9ALMNA | |
| SCHEMBL3670865 | 0.78 | THRB (0.70) | THRBAMY1AMAPTNPC1RAB9A | |
| SCHEMBL27940829 | 0.77 | MAPT (0.62) | THRBAMY1AMAPTNPC1RAB9A | |
| SCHEMBL15883590 | 0.76 | THRB (0.68) | THRBAMY1AMAPTNPC1RAB9A | |
| SCHEMBL2056453 | 0.75 | SMN1; SMN2 (0.59) | MAPTNPC1RAB9ALMNAHPGD | |
| SCHEMBL11649000 | 0.75 | MAPT (0.85) | THRBMAPTNPC1RAB9ALMNA | |
| SCHEMBL11648995 | 0.75 | MAPT (0.85) | THRBMAPTNPC1RAB9ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1845415-B1 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ ELECTRONIC MATERIALS USA (US) | 2014-04-30 | — | — | EP | claimed |
| EP-1465877-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2008-09-24 | — | — | EP | claimed |
| EP-1845415-A2 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ Electronic Materials USA Corp. (US) | 2007-10-17 | — | — | EP | claimed |
| EP-1720066-A2 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ Electronic Materials USA Corp. (US) | 2006-11-08 | — | — | EP | claimed |
| US-20060199103-A1 | Process for producing an image using a first minimum bottom antireflective coating composition | NEISSER MARK O | 2006-09-07 | — | — | US | claimed |
| EP-1466216-B1 | PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA (US) | 2006-07-26 | — | — | EP | claimed |
| US-7070914-B2 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-07-04 | — | — | US | claimed |
| US-6844131-B2 | Positive-working photoimageable bottom antireflective coating | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-01-18 | — | — | US | claimed |
| EP-1465877-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | Clariant International Ltd. (CH) | 2004-10-13 | — | — | EP | claimed |
| EP-1466216-A1 | PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2004-10-13 | — | — | EP | claimed |
| WO-2003057678-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | claimed |
| WO-2003058348-A1 | PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | claimed |
| US-20030129531-A1 | Positive-working photoimageable bottom antireflective coating | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | claimed |
| US-20030129547-A1 | Process for producing an image using a first minimum bottom antireflective coating composition | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | claimed |
| US-20230146910-A1 | METHODS AND COMPOSITIONS FOR IMPROVED PATTERNING OF PHOTORESIST | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-05-11 | — | — | US | disclosed |
| CN-116009357-A | Methods and compositions for improving photoresist patterning | 台湾积体电路制造股份有限公司 | 2023-04-25 | — | — | CN | disclosed |
| US-20220392764-A1 | UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-12-08 | — | — | US | disclosed |
| WO-2003058348-A1 | PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | disclosed |
| US-20030129531-A1 | Positive-working photoimageable bottom antireflective coating | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | disclosed |
| US-20030129547-A1 | Process for producing an image using a first minimum bottom antireflective coating composition | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | disclosed |