Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.40 |
| ▸ | CA2 | P00918 | 4/20 | 0.40 |
| ▸ | CA9 | Q16790 | 3/20 | 0.40 |
| ▸ | CA12 | O43570 | 2/20 | 0.40 |
| ▸ | CHRNA7 | P36544 | 3/20 | 0.39 |
| ▸ | PTGES2 | Q9H7Z7 | 1/20 | 0.39 |
| ▸ | ACMSD | Q8TDX5 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | STS | P08842 | 1/20 | 0.36 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.36 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.36 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.36 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.36 |
| ▸ | BACE1 | P56817 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17627844 | 0.83 | LMNA (0.37) | ACMSDLMNAHTTHSP90AA1MAPT | |
| SCHEMBL683462 | 0.83 | KMO (0.38) | ACMSDLMNAHTTHDAC4HDAC2 | |
| SCHEMBL2758385 | 0.83 | KMO (0.38) | ACMSDLMNAHTTHDAC4HDAC2 | |
| SCHEMBL2758386 | 0.83 | KMO (0.38) | ACMSDLMNAHTTHDAC4HDAC2 | |
| SCHEMBL2317187 | 0.81 | LMNA (0.39) | CA9CA12PTGES2ACMSDLMNA | |
| SCHEMBL21943821 | 0.81 | LMNA (0.38) | PTGES2ACMSDLMNAHTTKDM4E | |
| SCHEMBL2317192 | 0.81 | KMO (0.37) | ACMSDLMNAHTTHDAC4HDAC2 | |
| SCHEMBL2758387 | 0.81 | HDAC8 (0.36) | ACMSDLMNAHTTHDAC4HDAC2 | |
| SCHEMBL14949139 | 0.79 | LMNA (0.34) | LMNAHTTMAPTKMO | |
| SCHEMBL2758389 | 0.77 | HDAC8 (0.33) | ACMSDLMNAHTTHDAC4HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11429023-B2 | Onium salt, negative resist composition, and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-08-30 | — | — | US | disclosed |
| CN-111100043-B | Onium salt, negative resist composition and resist pattern forming method | 信越化学工业株式会社 | 2022-08-09 | — | — | CN | disclosed |
| EP-3644122-B1 | NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-12-30 | — | — | EP | disclosed |
| EP-3644122-B1 | NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-12-30 | — | — | EP | disclosed |
| CN-111100043-A | Onium salt, negative resist composition and resist pattern forming method | 信越化学工业株式会社 | 2020-05-05 | — | — | CN | disclosed |
| US-20200133121-A1 | ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-04-30 | — | — | US | disclosed |
| EP-3644122-A1 | ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-04-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200133121-A1 | ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | SLC6A5, SLC11A2, LARP7 | CA1 2060/4885CA2 425/4885CA9 686/4885 |
| US-11429023-B2 | Onium salt, negative resist composition, and resist pattern forming process | SLC6A5, SLC11A2, LARP7 | CA1 2060/4885CA2 425/4885CA9 686/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.