SCHEMBL218790

SCHEMBL218790

O=S(=O)(CC(O)O)CC(O)O

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10787504 0.83
SCHEMBL29239630 0.77 CA2 (0.48)
SCHEMBL270855 0.74
SCHEMBL2345878 0.72 TSHR (0.39)
SCHEMBL9574450 0.72
Ethylene SCHEMBL29024220 0.69 SLC22A6 (0.42)
Sulfuric Acid SCHEMBL28516928 0.67 CA5A (0.35)
SCHEMBL392175 0.67 SLC22A6 (0.40)
SCHEMBL10536083 0.67
SCHEMBL28608946 0.65 SLC22A6 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 555 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119191812-B Super-durability double-liquid grouting material 潍坊三建砼泰建筑材料有限公司 2025-02-11 CN claimed
CN-119191812-A Super-durability double-liquid grouting material 潍坊三建砼泰建筑材料有限公司 2024-12-27 CN claimed
CN-118563597-A High-weather-resistance formaldehyde-free facing paper and preparation method thereof 山东东宇鸿翔装饰材料有限公司 2024-08-30 CN claimed
CN-117512693-B Composite diaphragm with super-hydrophilic surface and integral cross-linked structure for alkaline water electrolysis hydrogen production and preparation method thereof 山东蓝拓氢能科技有限公司 2024-08-06 CN claimed
CN-118087276-A Water-absorbing quick-drying auxiliary agent, treatment method, fiber and fabric 联润翔(青岛)纺织科技有限公司 2024-05-28 CN claimed
CN-115181468-B Super-hydrophilic self-cleaning coating sol and preparation method and application thereof 泉州师范学院 2024-03-05 CN claimed
CN-117512693-A Composite diaphragm with super-hydrophilic surface and integral cross-linked structure for alkaline water electrolysis hydrogen production and preparation method thereof 山东蓝拓氢能科技有限公司 2024-02-06 CN claimed
CN-116948343-A Method for preparing plant growth-promoting liquid mulching film from corn stalks 潍坊科技学院 2023-10-27 CN claimed
CN-115232528-A Super-hydrophilic antibacterial coating sol and preparation method and application thereof 泉州师范学院 2022-10-25 CN claimed
CN-115181468-A Super-hydrophilic self-cleaning coating sol and preparation method and application thereof 泉州师范学院 2022-10-14 CN claimed
EP-0940454-A1 Ink, ink set, ink cartridge, recording unit, image recording method and image recording apparatus CANON KABUSHIKI KAISHA (JP) 1999-09-08 EP claimed
EP-0940455-A1 Ink, ink set, ink cartridge, recording unit, image recording method and image recording apparatus CANON KABUSHIKI KAISHA (JP) 1999-09-08 EP claimed
US-5764261-A INK SOLUTION CONTAINING A DISPERSE DYE HAVING SPECIFIC PARTICLE DIAMETER SELECTED FROM FORMALDEHYDE-NAPHTHALENE CONDENSATE OR DERIVATIVES OR ACRYLIC POLYMER, ORGANIC SOLVENT AND BISHYDROYETHYLSULFONE CANON KABUSHIKI KAISHA (JP) 1998-06-09 US claimed
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
US-5549740-A MIXTURE OF CATIONIC COMPOUND AND BIS(HYDROXYETHYL)SULFONE CANON KABUSHIKI KAISHA (JP) 1996-08-27 US claimed
EP-0711867-A1 Ink for ink-jet printing and the printing process therewith CANON KABUSHIKI KAISHA (JP) 1996-05-15 EP claimed
US-5470944-A Production of high molecular weight polylactic acid ARCH DEVELOPMENT CORPORATION (US) 1995-11-28 US claimed
US-5340685-A Light-sensitive composition containing diazo resin, polyurethane resin and fluorine atom-containing copolymer surfactant FUJI PHOTO FILM CO., LTD. (JP) 1994-08-23 US claimed
US-5272035-A Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive FUJI PHOTO FILM CO., LTD. (JP) 1993-12-21 US claimed
US-4898803-A BASED UPON A CARBOXYLIC-CONTAINING DIHYDROXY MONOMER; WEAR RESISTANCE; DURABILITY; POSITIVES; LITHOGRAPHIC PLATES; PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1990-02-06 US claimed