SCHEMBL218957

SCHEMBL218957

Cc1ccc(O)c(Cc2cc(C)cc(Cc3cc(C)cc(Cc4cc(C)ccc4O)c3O)c2O)c1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 1.00
HIF1A Q16665 4/20 0.55
CYP2C9 P11712 3/20 0.55
CYP2C19 P33261 3/20 0.55
SMN1; SMN2 Q16637 2/20 0.53
HSPA5 P11021 3/20 0.50
TRPA1 O75762 1/20 0.48
ALOX15 P16050 4/20 0.47
LMNA P02545 3/20 0.47
HPGD P15428 3/20 0.47
HTT P42858 2/20 0.47
MEN1 O00255 2/20 0.47
MAPT P10636 2/20 0.47
ALOX12 P18054 2/20 0.47
KMT2A Q03164 2/20 0.47
SLC22A1 O15245 1/20 0.47
USP2 O75604 1/20 0.47
HSP90AA1 P07900 1/20 0.47
CYP3A4 P08684 1/20 0.47
HSPD1 P10809 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1345917 1.00 AMY1A (1.00) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
SCHEMBL1345563 1.00 AMY1A (1.00) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
SCHEMBL29623092 1.00 AMY1A (1.00) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
SCHEMBL18352 1.00 AMY1A (1.00) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
SCHEMBL30320292 1.00 AMY1A (1.00) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
SCHEMBL3820165 1.00 AMY1A (1.00) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
SCHEMBL1345514 1.00 AMY1A (1.00) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
Phosphine SCHEMBL26919025 0.98 AMY1A (0.96) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
Formaldehyde SCHEMBL28912209 0.94 AMY1A (0.89) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2
SCHEMBL8078719 0.93 AMY1A (0.86) AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 473 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250110403-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US claimed
US-20250110399-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US claimed
EP-4045564-A1 PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF Promerus, LLC (US) 2022-08-24 EP claimed
WO-2021076131-A1 PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF PROMERUS, LLC (US) 2021-04-22 WO claimed
US-9562124-B2 Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof PROMERUS, LLC (US) 2017-02-07 US claimed
US-20160319060-A1 Thermo-oxidatively Stable, Side Chain Polyether Functionalized Polynorbornenes for Microelectronic and Optoelectronic Devices and Assemblies Thereof PROMERUS, LLC (US) 2016-11-03 US claimed
US-9425404-B2 Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof PROMERUS, LLC (US) 2016-08-23 US claimed
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP claimed
US-20090274974-A1 SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA CORP. 2009-11-05 US claimed
WO-2009133456-A1 SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-11-05 WO claimed
EP-1614005-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-01-11 EP claimed
US-6905809-B2 Photoresist compositions CLARIANT FINANCE (BVI) LIMITED (VG) 2005-06-14 US claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
WO-2004088424-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US claimed
US-5470937-A Liquid crystals IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1995-11-28 US claimed
US-5283314-A Polymerizing an oligomer of a dihydric phenol and a branching agent with a dihydric alcohol and a monohydric phenol with stirring IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1994-02-01 US claimed
US-5112936-A Impact resistant polycarbonates for blow molding IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1992-05-12 US claimed