Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5318552 | 0.82 | CYP2D6 (0.33) | CYP2D6CYP2C19HSD11B1EPHX2 | |
| SCHEMBL7160761 | 0.80 | EPHX2 (0.33) | CYP2D6CYP2C19EPHX2 | |
| SCHEMBL7607441 | 0.72 | — | — | |
| SCHEMBL7211598 | 0.72 | CYP2D6 (0.37) | CYP2D6CYP2C19ALDH1A1L3MBTL1SIGMAR1 | |
| SCHEMBL565525 | 0.71 | HSD11B1 (0.35) | CYP2D6CYP2C19HSD11B1EPHX2 | |
| SCHEMBL7703026 | 0.71 | MAPT (0.37) | CYP2D6CYP2C19SIGMAR1 | |
| SCHEMBL200115 | 0.70 | P2RX7 (0.41) | CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL18938394 | 0.70 | P2RX7 (0.41) | CYP2D6CYP2C19ALDH1A1 | |
| SCHEMBL13525792 | 0.69 | CYP2D6 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL565960 | 0.69 | CYP2D6 (0.37) | CYP2D6CYP2C19HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110171586-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-6849375-B2 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-01 | — | — | US | disclosed |
| US-20030022101-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | INTELLECTUAL DISCOVERY CO. LTD. (KR) | 2003-01-30 | — | — | US | disclosed |