Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX7 | Q99572 | 1/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 6/20 | 0.35 |
| ▸ | CYP17A1 | P05093 | 5/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | SCN1A | P35498 | 1/20 | 0.33 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.33 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | CETP | P11597 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18938394 | 0.79 | P2RX7 (0.41) | P2RX7CETPCYP2D6CYP2C19NPSR1 | |
| SCHEMBL200115 | 0.79 | P2RX7 (0.41) | P2RX7CETPCYP2D6CYP2C19NPSR1 | |
| SCHEMBL8961379 | 0.77 | P2RX7 (0.32) | P2RX7 | |
| SCHEMBL565525 | 0.77 | HSD11B1 (0.35) | P2RX7CYP2D6CYP2C19 | |
| Ethylene SCHEMBL20471720 | 0.76 | P2RX7 (0.40) | P2RX7CETPCYP2D6CYP2C19NPSR1 | |
| SCHEMBL8961432 | 0.76 | P2RX7 (0.31) | P2RX7 | |
| SCHEMBL5459313 | 0.76 | P2RX7 (0.38) | P2RX7CETPCYP2D6CYP2C19 | |
| SCHEMBL1451420 | 0.75 | P2RX7 (0.37) | P2RX7CETPCYP2D6CYP2C19MEN1 | |
| SCHEMBL5456663 | 0.75 | P2RX7 (0.39) | P2RX7CETPCYP2D6CYP2C19 | |
| SCHEMBL200228 | 0.75 | CYP2C19 (0.40) | P2RX7CETPCYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110171586-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-6849375-B2 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-01 | — | — | US | disclosed |
| US-20030022101-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | INTELLECTUAL DISCOVERY CO. LTD. (KR) | 2003-01-30 | — | — | US | disclosed |