SCHEMBL21923025

SCHEMBL21923025

O=S(=O)(NS(=O)(=O)C12CC3CC(CC(C3)C1)C2)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GBA1 P04062 1/20 0.44
ALDH1A1 P00352 3/20 0.43
LMNA P02545 1/20 0.43
KMT2A Q03164 2/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
MAPK1 P28482 1/20 0.41
EPHX2 P34913 1/20 0.41
HSD11B1 P28845 3/20 0.40
CA2 P00918 2/20 0.40
CA1 P00915 1/20 0.40
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP13 P45452 1/20 0.40
PSEN1 P49768 1/20 0.40
PSEN2 P49810 1/20 0.40
APH1B Q8WW43 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3240736 0.77 GAA (0.47) ALDH1A1LMNAKMT2ANPC1RAB9A
SCHEMBL812701 0.76 LMNA (0.71) GBA1ALDH1A1LMNAKMT2ANPC1
SCHEMBL16140246 0.75 GAA (0.37) ALDH1A1LMNASMN1; SMN2EPHX2CA2
SCHEMBL19808245 0.73 P2RX7 (0.53) GBA1ALDH1A1LMNAKMT2ANPC1
SCHEMBL29653769 0.71 CA1 (0.64) GBA1ALDH1A1LMNAKMT2ASMN1; SMN2
SCHEMBL798074 0.71 CA1 (0.64) GBA1ALDH1A1LMNAKMT2ASMN1; SMN2
SCHEMBL3454878 0.70 KMT2A (0.40) ALDH1A1LMNAKMT2ANPC1RAB9A
SCHEMBL25248699 0.69 EPHX2 (0.67) ALDH1A1KMT2ANPC1RAB9ASMN1; SMN2
SCHEMBL11324033 0.69 EPHX2 (0.57) ALDH1A1LMNAKMT2ANPC1RAB9A
SCHEMBL1302465 0.69 CA1 (0.61) GBA1ALDH1A1LMNAKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3644122-B1 NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2020-12-30 EP disclosed
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-04-30 US disclosed
EP-3644122-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2020-04-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SLC6A5, SLC11A2, LARP7 GBA1 3017/4885ALDH1A1 4692/4885LMNA 356/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.