SCHEMBL2192882

SCHEMBL2192882

C=Cc1ccc(C(=O)OC2CCCCc3ccccc32)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 1/20 0.56
TAS1R1 Q7RTX1 1/20 0.56
IDO1 P14902 3/20 0.43
ALDH1A1 P00352 4/20 0.42
KDM4E B2RXH2 1/20 0.42
HTT P42858 2/20 0.37
KMT2A Q03164 3/20 0.37
LMNA P02545 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
CHRM4 P08173 1/20 0.36
DRD2 P14416 1/20 0.36
HTR7 P34969 1/20 0.36
MEN1 O00255 2/20 0.36
GAA P10253 1/20 0.36
EPHX1 P07099 1/20 0.36
MAPT P10636 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9722001 0.82 IDO1 (0.55) TAS1R3TAS1R1IDO1ALDH1A1KDM4E
SCHEMBL92302 0.81 TAS1R3 (0.55) TAS1R3TAS1R1IDO1ALDH1A1KDM4E
SCHEMBL12416484 0.77 FFAR1 (0.45) IDO1ALDH1A1KDM4EHTTKMT2A
SCHEMBL2193202 0.76 IDO1 (0.39) TAS1R3TAS1R1IDO1ALDH1A1KDM4E
SCHEMBL8558598 0.76 IDO1 (0.53) IDO1ALDH1A1KDM4EHTTKMT2A
SCHEMBL9610480 0.76 TAS1R3 (0.46) TAS1R3TAS1R1KMT2ADRD2MEN1
SCHEMBL11548232 0.75 IDO1 (0.54) TAS1R3TAS1R1IDO1ALDH1A1HTT
SCHEMBL29733370 0.75 IDO1 (0.54) TAS1R3TAS1R1IDO1ALDH1A1HTT
SCHEMBL11999054 0.74 IDO1 (0.53) TAS1R3TAS1R1IDO1ALDH1A1SMN1; SMN2
SCHEMBL2778436 0.73 TAS1R3 (0.40) TAS1R3TAS1R1KDM4EKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed