Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR1 | O14842 | 4/20 | 0.45 |
| ▸ | CTSV | O60911 | 2/20 | 0.44 |
| ▸ | CTSL | P07711 | 2/20 | 0.44 |
| ▸ | CTSS | P25774 | 2/20 | 0.44 |
| ▸ | CTSK | P43235 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14088212 | 0.83 | FFAR1 (0.47) | FFAR1CTSVCTSLCTSSCTSK | |
| SCHEMBL14088211 | 0.79 | FFAR1 (0.45) | FFAR1CTSVCTSLCTSSCTSK | |
| SCHEMBL12416486 | 0.78 | CTSV (0.40) | FFAR1CTSVCTSLCTSSCTSK | |
| SCHEMBL9722001 | 0.78 | IDO1 (0.55) | FFAR1CTSVCTSLCTSSCTSK | |
| SCHEMBL2192882 | 0.77 | TAS1R3 (0.56) | ALDH1A1KDM4EIDO1HTTMEN1 | |
| SCHEMBL13144168 | 0.77 | HTT (0.51) | ALDH1A1POLBNPSR1HTTMEN1 | |
| SCHEMBL11998987 | 0.76 | FFAR1 (0.61) | FFAR1CTSVCTSLCTSSCTSK | |
| SCHEMBL13144169 | 0.76 | HTT (0.53) | ALDH1A1NPSR1HTTMEN1KMT2A | |
| SCHEMBL10262100 | 0.76 | MTNR1A (0.41) | ALDH1A1KDM4EPOLBNPSR1L3MBTL1 | |
| SCHEMBL2740688 | 0.75 | CTSV (0.49) | FFAR1CTSVCTSLCTSSCTSK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8501384-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20110171580-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |