SCHEMBL2194428

SCHEMBL2194428

C1=Cc2cccc3cccc1c23.C=C(C)C(=O)Oc1ccc(O)cc1.C=Cc1ccc(OC)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.38
MAPT P10636 6/20 0.37
KMT2A Q03164 5/20 0.37
MEN1 O00255 3/20 0.37
ALDH1A1 P00352 2/20 0.37
P4HB P07237 1/20 0.37
CALM1 P0DP23 1/20 0.37
RAB9A P51151 1/20 0.37
F3 P13726 1/20 0.37
XDH P47989 1/20 0.37
S100B P04271 1/20 0.36
STAT3 P40763 1/20 0.36
MMP1 P03956 1/20 0.35
MMP2 P08253 1/20 0.35
MMP9 P14780 1/20 0.35
MIF P14174 1/20 0.34
GFER P55789 1/20 0.34
ATM Q13315 1/20 0.34
ABCG2 Q9UNQ0 2/20 0.33
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
2-Mercaptoethanol SCHEMBL2190819 0.93 ELANE (0.34) ELANEMAPTKMT2AMEN1ALDH1A1
SCHEMBL2191668 0.91 ELANE (0.32) ELANEMAPTKMT2AMEN1ALDH1A1
4-Vinylphenol SCHEMBL2190252 0.88 S100B (0.46) MAPTKMT2AMEN1ALDH1A1P4HB
Methacrylic Acid SCHEMBL15795982 0.84 ELANE (0.48) ELANEMAPTKMT2AMEN1ALDH1A1
4-Vinylphenol SCHEMBL15157512 0.81 ELANE (0.50) ELANEMAPTKMT2AMEN1ALDH1A1
4-Vinylphenol SCHEMBL2191047 0.80 S100B (0.39) MAPTKMT2AMEN1ALDH1A1P4HB
Styrene SCHEMBL16660458 0.78 ELANE (0.57) ELANEMAPTKMT2AMEN1ALDH1A1
4-Vinylphenol SCHEMBL2195434 0.77 S100B (0.37) MAPTKMT2AMEN1ALDH1A1P4HB
4-Vinylphenol SCHEMBL766769 0.77 ALDH1A1 (0.39) MAPTKMT2AMEN1ALDH1A1RAB9A
SCHEMBL16660449 0.77 ELANE (0.48) ELANEMAPTKMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8597868-B2 Negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-12-03 US disclosed
US-20110171579-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed