Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | GRM2 | Q14416 | 2/20 | 0.35 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | FAAH | O00519 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4990698 | 0.78 | THRB (0.38) | THRBCYP2C9LMNAEPHX1EPHX2 | |
| SCHEMBL2190387 | 0.75 | THRB (0.35) | THRBCYP2C9LMNAGRM2GRM3 | |
| SCHEMBL10976047 | 0.75 | THRB (0.39) | THRBCYP2C9LMNAGRM2GRM3 | |
| SCHEMBL9724273 | 0.75 | THRB (0.39) | THRBCYP2C9LMNAGRM2GRM3 | |
| SCHEMBL2196307 | 0.75 | GRM2 (0.36) | GRM2GRM3EPHX2ALDH1A1MEN1 | |
| Acetic Acid SCHEMBL700515 | 0.74 | THRB (0.42) | THRBCYP2C9LMNAEPHX1EPHX2 | |
| SCHEMBL6865794 | 0.73 | THRB (0.40) | THRBCYP2C9GRM2GRM3EPHX1 | |
| SCHEMBL27694057 | 0.72 | GRIN2D (0.30) | — | |
| Adamantane SCHEMBL28647589 | 0.72 | GRM2 (0.41) | LMNAGRM2GRM3EPHX1EPHX2 | |
| Carbamic Acid SCHEMBL27703081 | 0.71 | THRB (0.39) | THRBCYP2C9LMNAGRM2GRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9522868-B2 | Tetrakis(ether-substituted formylphenyl) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-01-21 | — | — | US | disclosed |
| US-20110172457-A1 | TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) AND NEW POLYNUCLEAR POLYPHENOL DERIVED FROM THE SAME | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-7678528-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-03-16 | — | — | US | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | disclosed |
| US-20090068586-A1 | SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| EP-1963919-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-09-03 | — | — | EP | disclosed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | disclosed |
| WO-2007057773-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-24 | — | — | WO | disclosed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-20060222866-A1 | Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-10-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | AHR, PAH, ALK | THRB 524/4885CYP2C9 137/4885LMNA 3411/4885 |
| US-20110172457-A1 | TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) AND NEW POLYNUCLEAR POLYPHENOL DERIVED FROM THE SAME | AHR, PAH, ARNT | THRB 2189/4885CYP2C9 1163/4885LMNA 3268/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.