SCHEMBL2195300

SCHEMBL2195300

C=CCCOC(=O)CCC

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.47
DGKA P23743 1/20 0.45
ALDH1A1 P00352 4/20 0.44
LMNA P02545 1/20 0.41
MGLL Q99685 1/20 0.40
HPGD P15428 1/20 0.39
MAPT P10636 2/20 0.39
THRB P10828 1/20 0.39
CNR1 P21554 1/20 0.39
ADRA2A P08913 1/20 0.39
ADRA1A P35348 1/20 0.39
DNM1 Q05193 1/20 0.38
BLM P54132 1/20 0.38
HTR2C P28335 1/20 0.37
NAAA Q02083 1/20 0.36
PLA2G2C Q5R387 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21986647 0.88 TSHR (0.58) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL21986655 0.88 TSHR (0.49) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL21986659 0.86 ALDH1A1 (0.50) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL10404247 0.86 TSHR (0.66) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL24090417 0.85 DGKA (0.69) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL18481233 0.85 LMNA (0.53) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL21700120 0.85 DGKA (0.69) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL20388171 0.85 DGKA (0.69) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL17425428 0.85 DGKA (0.69) TSHRDGKAALDH1A1LMNAMGLL
SCHEMBL2137245 0.85 ALDH1A1 (0.41) TSHRDGKAALDH1A1LMNAMGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4396706-A ADDITION INTERPOLYMER PARTICLES, MATTES FUJI PHOTO FILM CO., LTD. (JP) 1983-08-02 US claimed
US-11655360-B2 Gas-barrier resin composition and use thereof SHOWA DENKO K.K. (JP) 2023-05-23 US disclosed
CN-110799600-B Gas barrier resin composition and use thereof 昭和电工株式会社 2022-06-21 CN disclosed
US-20210147669-A1 GAS-BARRIER RESIN COMPOSITION AND USE THEREOF SHOWA DENKO K.K. (JP) 2021-05-20 US disclosed
EP-3660105-A1 GAS-BARRIER RESIN COMPOSITION AND USE THEREOF Showa Denko K.K. (JP) 2020-06-03 EP disclosed
CN-110799600-A Gas barrier resin composition and use thereof 昭和电工株式会社 2020-02-14 CN disclosed
WO-2019025575-A1 PROCESSES FOR PREPARING COMPLEXES COMPRISING RHODIUM(II) AND CARBOXYLATE LIGANDS STOCKHOLM UNIVERSITY HOLDING AB (SE) 2019-02-07 WO disclosed
US-7976914-B2 Resin film, production method thereof, polarizing plate and liquid crystal display device FUJIFILM CORPORATON (JP) 2011-07-12 US disclosed
US-20070290168-A1 Resin film, production method thereof, polarizing plate and liquid crystal display device FUJIFILM CORPORATION (JP) 2007-12-20 US disclosed
US-5705329-A SUPPORT WITH PHOTOGRAPHIC MATERIAL, POLYMER LAYER AND SILVER HALIDE EMULSION LAYER KONICA CORPORATION (JP) 1998-01-06 US disclosed
US-5677101-A CONTAINING AN O-QUINONEDIAZIDE COMPOUND KONICA CORPORATION (JP) 1997-10-14 US disclosed
EP-0706082-A1 A silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1996-04-10 EP disclosed
US-4535045-A WITH UNSATURATED CARBOXYLATED MONOMER AND UINYL MONOMER WITH HYDROXYL GROUP FUJI PHOTO FILM CO., LTD. (JP) 1985-08-13 US disclosed
US-4407939-A GELATIN MODIFIED WITH SUCCINIC, PHTHALIC OR TRIMELLITIC ANHYDRIDE POSITIONED BETWEEN FUJI PHOTO FILM CO., LTD. (JP) 1983-10-04 US disclosed
US-4396706-A ADDITION INTERPOLYMER PARTICLES, MATTES FUJI PHOTO FILM CO., LTD. (JP) 1983-08-02 US disclosed