Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | RHEB | Q15382 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | DPP4 | P27487 | 1/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.34 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.34 |
| ▸ | KDM1A | O60341 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | HTR1A | P08908 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10499152 | 0.87 | DPP4 (0.53) | ALDH1A1KMT2ATDP1HPGDDPP4 | |
| SCHEMBL18718123 | 0.83 | NFE2L2 (0.41) | ALDH1A1KMT2AMEN1TDP1HPGD | |
| SCHEMBL181965 | 0.81 | ALDH1A1 (0.55) | ALDH1A1KMT2AMEN1TDP1HPGD | |
| SCHEMBL20800776 | 0.79 | ALDH1A1 (0.36) | ALDH1A1KMT2AMEN1TDP1HPGD | |
| SCHEMBL6727676 | 0.79 | SLC6A2 (0.41) | ALDH1A1HPGDDPP4SLC6A2SLC6A4 | |
| SCHEMBL27920138 | 0.79 | ALDH1A1 (0.52) | ALDH1A1KMT2AMEN1TDP1HPGD | |
| SCHEMBL16334874 | 0.77 | NFE2L2 (0.41) | ALDH1A1KMT2AMEN1TDP1HSP90AA1 | |
| SCHEMBL20541477 | 0.76 | BACE1 (0.36) | ALDH1A1KMT2AMEN1TDP1HPGD | |
| SCHEMBL8363460 | 0.76 | ALDH1A1 (0.44) | ALDH1A1KMT2AMEN1TDP1HSP90AA1 | |
| SCHEMBL1144734 | 0.76 | ALDH1A1 (0.38) | ALDH1A1KMT2AHPGDSMN1; SMN2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115210219-A | Oxime ester photoinitiators | 巴斯夫欧洲公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-113316744-A | Oxime ester photoinitiators with specific aroyl chromophores | 巴斯夫欧洲公司 | 2021-08-27 | — | — | CN | disclosed |
| US-7976914-B2 | Resin film, production method thereof, polarizing plate and liquid crystal display device | FUJIFILM CORPORATON (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |
| US-20070290168-A1 | Resin film, production method thereof, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2007-12-20 | — | — | US | disclosed |
| CN-101023084-A | Compositions containing phthalocyanine dyes | CIBA SC HOLDING AG (CH) | 2007-08-22 | — | — | CN | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| EP-1698645-A1 | HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER | Lion Corporation (JP) | 2006-09-06 | — | — | EP | disclosed |
| EP-1692094-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ Electronic Materials USA Corp. (US) | 2006-08-23 | — | — | EP | disclosed |
| US-7030201-B2 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-04-18 | — | — | US | disclosed |
| EP-0851300-B1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO LTD (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-0823661-B1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO LTD (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-6248500-B1 | ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| EP-1077392-A1 | Photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| US-6165684-A | Bottom anti-reflective coating material composition and method for forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-26 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0989463-A2 | Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-29 | — | — | EP | disclosed |
| EP-0851300-A1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 1998-07-01 | — | — | EP | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |
| US-4916053-A | INCLUDING AN AMIDE-OR IMIDE-CONTAINING VINYL POLYMER IN THE CRYSTALLINE EMULSION LAYER; HIGH SENSITIVITY, GOOD GRAININESS AND LOW FOG IN NEGATIVE-TYPE MATERIEALS | FUJI PHOTO FILM CO., LTD. (JP) | 1990-04-10 | — | — | US | disclosed |