Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 4/20 | 0.41 |
| ▸ | RAB9A | P51151 | 4/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.38 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | RPA1 | P27694 | 1/20 | 0.35 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.35 |
| ▸ | NOTUM | Q6P988 | 2/20 | 0.34 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.34 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.34 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.34 |
| ▸ | KMO | O15229 | 1/20 | 0.33 |
| ▸ | DHFR | P00374 | 1/20 | 0.33 |
| ▸ | CASP3 | P42574 | 1/20 | 0.33 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.33 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27689580 | 0.84 | NPC1 (0.39) | HRH4NPC1RAB9AMAPTMEN1 | |
| SCHEMBL19625444 | 0.84 | HRH4 (0.48) | HRH4NPC1RAB9AMAPTMEN1 | |
| SCHEMBL2367747 | 0.83 | NPC1 (0.38) | NPC1RAB9AMAPTMEN1KMT2A | |
| SCHEMBL14536813 | 0.81 | HRH4 (0.31) | HRH4 | |
| SCHEMBL80044 | 0.80 | NPC1 (0.52) | NPC1RAB9AMAPTMEN1KMT2A | |
| SCHEMBL644691 | 0.80 | CLK4 (0.47) | NPC1RAB9AMAPTMEN1KMT2A | |
| SCHEMBL5574497 | 0.80 | CYP19A1 (0.42) | NPC1RAB9AMAPTMAP4K4SMN1; SMN2 | |
| SCHEMBL125517 | 0.79 | NPC1 (0.50) | NPC1RAB9AMAPTMEN1KMT2A | |
| SCHEMBL10803923 | 0.77 | KMT2A (0.41) | NPC1RAB9AMAPTMEN1KMT2A | |
| SCHEMBL4413811 | 0.76 | KDM4E (0.39) | NPC1RAB9AMAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1301829-A4 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-06-28 | — | — | EP | claimed |
| EP-1303789-A4 | T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS | ARCH SPEC CHEM INC (US) | 2005-09-28 | — | — | EP | claimed |
| EP-1303789-A1 | T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-23 | — | — | EP | claimed |
| EP-1301829-A1 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-16 | — | — | EP | claimed |
| US-6514664-B1 | Radiation sensitive compositions containing image quality and profile enhancement additives | ARCH SPECIALTY CHEMICALS, INC. | 2003-02-04 | — | — | US | claimed |
| WO-2002008834-A1 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-01-31 | — | — | WO | claimed |
| WO-2002006895-A1 | T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC (US) | 2002-01-24 | — | — | WO | claimed |
| US-6312870-B1 | t-butyl cinnamate polymers and their use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2001-11-06 | — | — | US | claimed |
| US-5624787-A | NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-04-29 | — | — | US | claimed |
| US-7977027-B2 | Base resin is a polyvinylphenol derivative having an alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali; a sulfonium phtoacid generator, tris(2-(methoxymethoxy)ethyl)amine oxide, a solvent; photoresist; high resolution | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7629108-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-08 | — | — | US | disclosed |
| US-7468236-B2 | Amine compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-23 | — | — | US | disclosed |
| US-7378548-B2 | Tertiary amine compounds having an ester structure and processes for preparing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-27 | — | — | US | disclosed |
| US-20080102405-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-01 | — | — | US | disclosed |
| US-5856561-A | Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| US-5849461-A | Chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-15 | — | — | US | disclosed |
| US-5824824-A | AROMATIC SULFONATE ANIONS AND DISSOLUTION CONTRAST IN EXPOSED AND NONEXPOSED AREAS, POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-10-20 | — | — | US | disclosed |
| US-5750309-A | POLYHYDROXYSTYRENE, PHOTOACID GENERATOR, SOLVENT, DISSOLUTION INHIBITOR; FOR FINE PATTERNING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-05-12 | — | — | US | disclosed |
| US-5679496-A | CONTAINING SULFONIUM SALT HAVING TERT-BUTOXYCARBONYLMETHOXY GROUP(S) AS ACID LABILE GROUPS; SENSITIVITY, RESOLUTION, ETCH AND HEAT RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| US-5624787-A | NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-04-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080102405-A1 | Nitrogen-containing organic compound, resist composition and patterning process | MDM4, MUS81, NOP2 | HRH4 2199/4885NPC1 3325/4885RAB9A 3852/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.