Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 4/20 | 0.38 |
| ▸ | RAB9A | P51151 | 4/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.38 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.38 |
| ▸ | RELA | Q04206 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.36 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.36 |
| ▸ | ADORA2B | P29275 | 1/20 | 0.36 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27689580 | 0.96 | NPC1 (0.39) | NPC1RAB9AMAPK1LMNASMN1; SMN2 | |
| Biphenyl SCHEMBL864069 | 0.86 | ALDH1A1 (0.39) | NPC1RAB9ALMNASMN1; SMN2NFKB1 | |
| SCHEMBL10803923 | 0.85 | KMT2A (0.41) | NPC1RAB9ALMNASMN1; SMN2RELA | |
| SCHEMBL2199254 | 0.83 | HRH4 (0.45) | NPC1RAB9ASMN1; SMN2KMT2AMEN1 | |
| SCHEMBL4413811 | 0.81 | KDM4E (0.39) | NPC1RAB9ALMNASMN1; SMN2NFKB1 | |
| SCHEMBL5574497 | 0.81 | CYP19A1 (0.42) | NPC1RAB9ASMN1; SMN2L3MBTL1MAPT | |
| SCHEMBL24795085 | 0.81 | L3MBTL1 (0.41) | NPC1RAB9AMAPK1LMNASMN1; SMN2 | |
| SCHEMBL4900598 | 0.79 | MEN1 (0.47) | NPC1RAB9AMAPK1LMNASMN1; SMN2 | |
| SCHEMBL80527 | 0.79 | MEN1 (0.47) | NPC1RAB9AMAPK1LMNASMN1; SMN2 | |
| SCHEMBL14536813 | 0.79 | HRH4 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | claimed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | claimed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | claimed |
| CN-105246993-A | Curable composition, method of preparing cured article, and cured article formed thereby | DOW CORNING | 2016-01-13 | — | — | CN | disclosed |
| CN-105209244-A | Method of making an article and article made by the method | DOW CORNING | 2015-12-30 | — | — | CN | disclosed |
| CN-103764625-A | Novel compound | TOKYO OHKA KOGYO CO LTD | 2014-04-30 | — | — | CN | disclosed |
| EP-2375287-B1 | Radiation sensitive composition | FOUNDER FINE CHEMICAL INDUSTRY CO LTD (TW) | 2013-06-05 | — | — | EP | disclosed |
| EP-2366544-B1 | Radiation sensitive composition | FOUNDER FINE CHEMICAL INDUSTRY CO LTD (TW) | 2012-07-18 | — | — | EP | disclosed |
| EP-2375287-A1 | Radiation sensitive composition | Founder Fine Chemical Industry Co., Ltd. (TW) | 2011-10-12 | — | — | EP | disclosed |
| EP-2366544-A1 | Radiation sensitive composition | Founder Fine Chemical Industry Co., Ltd. (TW) | 2011-09-21 | — | — | EP | disclosed |
| CN-100465211-C | Active energy ray-curable organopolysiloxane resin composition, light-transmitting component, and method for manufacturing the light-transmitting component | DOW CORNING TORAY CO LTD (JP) | 2009-03-04 | — | — | CN | disclosed |
| CN-100465212-C | Active energy ray-curable organopolysiloxane resin composition, light-transmitting component, and method for producing same | DOW CORNING TORAY CO LTD (JP) | 2009-03-04 | — | — | CN | disclosed |
| WO-2006014708-A9 | THERMALLY SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS | CITIPLATE INC (US) | 2006-04-06 | — | — | WO | disclosed |
| WO-2006014708-A2 | THERMALLY SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS | CITIPLATE, INC. (US) | 2006-02-09 | — | — | WO | disclosed |
| US-20020094483-A1 | Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method | HITACHI, LTD. | 2002-07-18 | — | — | US | disclosed |
| EP-0453237-B1 | Photosensitive, heat-resistant resin composition and pattern formation process | FUJITSU LTD (JP) | 1998-12-09 | — | — | EP | disclosed |
| EP-0466025-A2 | Resist material, method for the production of the same and process of forming resist patterns using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1992-01-15 | — | — | EP | disclosed |