SCHEMBL2200062

SCHEMBL2200062

O=C(C(=O)c1ccccc1SCc1ccc(O)cc1)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 4/20 0.51
▸ KMT2A Q03164 5/20 0.49
▸ L3MBTL1 Q9Y468 1/20 0.49
▸ PTPRG P23470 1/20 0.48
▸ MEN1 O00255 4/20 0.47
▸ HTT P42858 1/20 0.45
▸ RAB9A P51151 1/20 0.44
▸ CES1 P23141 3/20 0.42
▸ IDO1 P14902 1/20 0.42
▸ KDM4E B2RXH2 2/20 0.42
▸ CYP1A2 P05177 1/20 0.41
▸ FNTA P49354 1/20 0.40
▸ FNTB P49356 1/20 0.40
▸ POLB P06746 1/20 0.40
▸ LMNA P02545 1/20 0.39
▸ MAPK1 P28482 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ PTPRC P08575 1/20 0.39
▸ KDR P35968 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9232779 0.81 PTPRG (0.76) KMT2AL3MBTL1PTPRGMEN1HTT
SCHEMBL1901284 0.74 PTPRG (0.67) KMT2AL3MBTL1PTPRGMEN1HTT
SCHEMBL11729716 0.74 KMT2A (0.64) KMT2AL3MBTL1PTPRGMEN1HTT
SCHEMBL2387804 0.73 CES2 (0.58) CES2RAB9ACES1KDM4EPOLB
SCHEMBL16390244 0.73 POLB (0.63) CES2RAB9ACES1POLB
Benzil SCHEMBL9666334 0.73 CES2 (0.95) CES2KMT2AMEN1HTTRAB9A
SCHEMBL28463445 0.73 IDO1 (0.58) CES2KMT2AL3MBTL1MEN1RAB9A
SCHEMBL11724672 0.71 KMT2A (0.65) KMT2AL3MBTL1PTPRGMEN1HTT
SCHEMBL292247 0.71 KMT2A (0.61) KMT2AL3MBTL1PTPRGMEN1HTT
SCHEMBL6291181 0.71 KMT2A (0.60) KMT2AL3MBTL1PTPRGMEN1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7977030-B2 Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming TOKYO OHKA KOGYO CO., LTD. (JP) 2011-07-12 — — US disclosed
US-20080311511-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND METHOD FOR PATTERN FORMING TOKYO OHKA KOGYO CO., LTD. (JP) 2008-12-18 — — US disclosed
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