Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 3/20 | 0.85 |
| ▸ | ANPEP | P15144 | 1/20 | 0.35 |
| ▸ | ERAP2 | Q6P179 | 1/20 | 0.35 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2472093 | 0.92 | FDPS (1.00) | FDPSANPEPERAP2MMP1MMP2 | |
| N-(Hexamethyleneimino)Methylenebisphosphonic Acid SCHEMBL12309768 | 0.92 | FDPS (1.00) | FDPSANPEPERAP2MMP1MMP2 | |
| SCHEMBL898693 | 0.88 | FDPS (0.75) | FDPSANPEPERAP2MMP2 | |
| SCHEMBL203348 | 0.88 | FDPS (0.75) | FDPSANPEPERAP2MMP2 | |
| SCHEMBL3080928 | 0.88 | FDPS (0.75) | FDPSANPEPERAP2MMP2 | |
| SCHEMBL15005243 | 0.82 | FDPS (0.59) | FDPSANPEPERAP2 | |
| SCHEMBL10346154 | 0.80 | FDPS (0.84) | FDPS | |
| SCHEMBL9356971 | 0.79 | FDPS (0.62) | FDPS | |
| Thiomorpholinomethylenediphosphonic Acid SCHEMBL1471965 | 0.77 | FDPS (1.00) | FDPS | |
| SCHEMBL26029597 | 0.77 | FDPS (0.60) | FDPS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230295537-A1 | MICROELECTRONIC DEVICE CLEANING COMPOSITION | ENTEGRIS, INC. | 2023-09-21 | — | — | US | claimed |
| WO-2023069409-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | ENTEGRIS, INC. (US) | 2023-04-27 | — | — | WO | claimed |
| US-20230121639-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | ENTEGRIS, INC. | 2023-04-20 | — | — | US | claimed |
| EP-4136273-A1 | METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM | Entegris, Inc. (US) | 2023-02-22 | — | — | EP | claimed |
| US-20230030323-A1 | METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2023-02-02 | — | — | US | claimed |
| US-20210324525-A1 | METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2021-10-21 | — | — | US | claimed |
| WO-2021211708-A1 | METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM | ENTEGRIS, INC. (US) | 2021-10-21 | — | — | WO | claimed |
| US-11124746-B2 | Post CMP cleaning composition | ENTEGRIS, INC. (US) | 2021-09-21 | — | — | US | claimed |
| US-11085011-B2 | Post CMP cleaning compositions for ceria particles | ENTEGRIS, INC. (US) | 2021-08-10 | — | — | US | claimed |
| US-10731109-B2 | Post chemical mechanical polishing formulations and method of use | ENTEGRIS, INC. (US) | 2020-08-04 | — | — | US | claimed |
| US-8557757-B2 | Multipurpose acidic, organic solvent based microelectronic cleaning composition | AVANTOR PERFORMANCE MATERIALS, INC. (US) | 2013-10-15 | — | — | US | claimed |
| EP-2401352-B1 | STRIPPING COMPOSITIONS FOR CLEANING ION IMPLANTED PHOTORESIST FROM SEMICONDUCTOR DEVICE WAFERS | AVANTOR PERFORMANCE MAT INC (US) | 2013-06-12 | — | — | EP | claimed |
| WO-2013058770-A1 | NON-AMINE POST-CMP COMPOSITION AND METHOD OF USE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-04-25 | — | — | WO | claimed |
| US-20100261632-A1 | NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2010-10-14 | — | — | US | claimed |
| US-20080050513-A1 | PREVENTION OF QUANTUM DOT QUENCHING ON METAL SURFACES | CAMBRIOS TECHNOLOGIES CORPORATION (US) | 2008-02-28 | — | — | US | claimed |
| US-7235227-B2 | Paramagnetic particles that provide improved relaxivity | BARNES-JEWISH HOSPITAL (US) | 2007-06-26 | — | — | US | claimed |
| EP-1326951-B1 | STABILIZED ALKALINE COMPOSITIONS FOR CLEANING MICROELECTRONIC SUBSTRATES | MALLINCKRODT BAKER INC (US) | 2005-02-02 | — | — | EP | claimed |
| US-20030215392-A1 | Paramagnetic particles that provide improved relaxivity | KEREOS, INC. | 2003-11-20 | — | — | US | claimed |
| US-6599370-B2 | Stabilized alkaline compositions for cleaning microelectronic substrates | MALLINCKRODT INC. | 2003-07-29 | — | — | US | claimed |
| US-20020077259-A1 | Stabilized alkaline compositions for cleaning microlelectronic substrates | AVANTOR PERFORMANCE MATERIALS, LLC | 2002-06-20 | — | — | US | claimed |