Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.45 |
| ▸ | CES2 | O00748 | 3/20 | 0.45 |
| ▸ | CES1 | P23141 | 3/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 3/20 | 0.38 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4738628 | 0.95 | LMNA (0.49) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL28353809 | 0.87 | LMNA (0.52) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL30478610 | 0.86 | CES2 (0.50) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL665971 | 0.86 | CES2 (0.50) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL3312136 | 0.86 | CES2 (0.50) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL13982035 | 0.86 | CES2 (0.50) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL28633705 | 0.85 | TDP1 (0.41) | LMNACES2CES1MAPK1SMN1; SMN2 | |
| SCHEMBL424944 | 0.81 | KDM4E (0.46) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL29038439 | 0.81 | LMNA (0.46) | LMNACES2CES1KDM4EMAPK1 | |
| SCHEMBL4738627 | 0.80 | CES2 (0.56) | LMNACES2CES1KDM4EMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1245 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4684812-A1 | 3D PRINTING INK COMPOSITION AND 3D PRINTING MOLDED ARTICLE FORMED BY CURING SAME | Aldaver Inc. (KR) | 2026-01-28 | — | — | EP | claimed |
| US-12157842-B2 | Photocurable adhesive compositions | HENKEL AG & CO. KGAA (DE) | 2024-12-03 | — | — | US | claimed |
| CN-115340834-B | Explosion-proof membrane and preparation method thereof | 新纶电子材料(常州)有限公司 | 2024-05-28 | — | — | CN | claimed |
| EP-3630855-B1 | LOW-VISCOSITY PHOTOCURABLE ADHESIVE COMPOSITIONS | HENKEL AG & CO KGAA (DE) | 2024-05-01 | — | — | EP | claimed |
| WO-2024049214-A1 | METHOD FOR MANUFACTURING ELECTRODE LAMINATE | 주식회사 엘지에너지솔루션 | 2024-03-07 | — | — | WO | claimed |
| CN-116529900-A | Double slit die for simultaneous electrode slurry coating and insulating solution coating and coating method using the same | 株式会社LG新能源 | 2023-08-01 | — | — | CN | claimed |
| EP-4209277-A1 | DOUBLE SLOT DIE FOR SIMULTANEOUSLY PERFORMING ELECTRODE SLURRY COATING AND INSULATING LIQUID COATING, AND COATING METHOD USING SAME | LG Energy Solution, Ltd. (KR) | 2023-07-12 | — | — | EP | claimed |
| WO-2023096070-A1 | DOUBLE SLOT DIE FOR SIMULTANEOUSLY PERFORMING ELECTRODE SLURRY COATING AND INSULATING LIQUID COATING, AND COATING METHOD USING SAME | 주식회사 엘지에너지솔루션 | 2023-06-01 | — | — | WO | claimed |
| CN-115340834-A | Explosion-proof membrane and preparation method thereof | 新纶电子材料(常州)有限公司 | 2022-11-15 | — | — | CN | claimed |
| US-11491711-B2 | Method of making 3D printed objects using two distinct light sources | PHOTOCENTRIC LIMITED (GB) | 2022-11-08 | — | — | US | claimed |
| EP-2182410-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THOSE PRODUCTS | Hitachi Chemical Company, Ltd. (JP) | 2010-05-05 | — | — | EP | claimed |
| US-20100027950-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN CURED MATTER, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE RESIN FILM CURED MATTER AND OPTICAL WAVEGUIDE OBTAINED BY USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-02-04 | — | — | US | claimed |
| US-20090312453-A1 | Composition for Alignment Film Having Excellent Adhesiveness | LG CHEM, LTD. (KR) | 2009-12-17 | — | — | US | claimed |
| EP-2053087-A1 | RESIN COMPOSITION FOR OPTICAL USE, RESIN MATERIAL FOR OPTICAL USE USING THE SAME, OPTICAL FILTER FOR IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE | Hitachi Chemical Co., Ltd. (JP) | 2009-04-29 | — | — | EP | claimed |
| WO-2008079519-A1 | PHOTOSENSITIVE COMPOSITION WITH LOW YELLOWING UNDER UV-LIGHT AND SUNLIGHT EXPOSURE | CLAST TRADING LIMITED (CN) | 2008-07-03 | — | — | WO | claimed |
| WO-2008073664-A1 | POLY(ETHYLENEOXIDE) SILOXANE GEL ELECTROLYTES | UCHICAGO ARGONNE, LLC (US) | 2008-06-19 | — | — | WO | claimed |
| US-20080134492-A1 | POLY(ETHYLENEOXIDE) SILOXANE GEL ELECTROLYTES | UCHICAGO ARGONNE, LLC | 2008-06-12 | — | — | US | claimed |
| WO-2008060109-A1 | COMPOSITION FOR ALIGNMENT FILM HAVING EXCELLENT ADHESIVENESS | LG CHEM, LTD. (KR) | 2008-05-22 | — | — | WO | claimed |
| US-7309550-B2 | Photosensitive composition with low yellowing under UV-light and sunlight exposure | CHEMENCE, INC. (US) | 2007-12-18 | — | — | US | claimed |
| US-20070099119-A1 | Photosensitive composition with low yellowing under UV-light and sunlight exposure | CHEMENCE, INC. | 2007-05-03 | — | — | US | claimed |