Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 5/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | CES2 | O00748 | 1/20 | 0.42 |
| ▸ | CES1 | P23141 | 1/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.41 |
| ▸ | CHRM3 | P20309 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28353809 | 0.93 | LMNA (0.52) | KDM4ELMNAMAPK1CES2CES1 | |
| SCHEMBL28408919 | 0.90 | LMNA (0.43) | LMNAMAPK1CES2CES1CHRM2 | |
| SCHEMBL821932 | 0.90 | LMNA (0.52) | LMNAMAPK1CES2CES1CHRM2 | |
| SCHEMBL26611026 | 0.90 | LMNA (0.52) | LMNAMAPK1CES2CES1CHRM2 | |
| SCHEMBL27935993 | 0.85 | CHRM1 (0.57) | KDM4ELMNACHRM2CHRM1CHRM3 | |
| SCHEMBL5072148 | 0.83 | ALDH1A1 (0.49) | KDM4ELMNAMAPK1CHRM2CHRM1 | |
| SCHEMBL821833 | 0.83 | LMNA (0.48) | LMNAMAPK1CES2CES1CHRM2 | |
| Benzoin SCHEMBL11789188 | 0.82 | LMNA (0.68) | KDM4ELMNAMAPK1CES2CES1 | |
| SCHEMBL28485791 | 0.82 | LMNA (0.44) | KDM4ELMNAMAPK1CES2CES1 | |
| SCHEMBL220962 | 0.81 | LMNA (0.45) | KDM4ELMNAMAPK1CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 758 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119462617-B | Anti-ultraviolet agent, preparation method thereof, resin mixture and application thereof | 珠海莫界科技有限公司 | 2026-05-19 | — | — | CN | claimed |
| CN-119529285-A | Anti-ultraviolet agent, preparation method thereof, anti-ultraviolet resin and application thereof | 珠海莫界科技有限公司 | 2025-02-28 | — | — | CN | claimed |
| CN-119462539-A | Optical monomer and preparation method thereof, composition, resin material and preparation method and application thereof | 珠海莫界科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119462617-A | High-curing anti-ultraviolet agent, preparation method thereof, resin mixture and application thereof | 珠海莫界科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119462698-A | Optical monomer with high refractive index, preparation method thereof, resin mixture and application thereof | 珠海莫界科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119462697-A | Optical monomer and preparation method thereof, composition, nano-imprinting adhesive, application of nano-imprinting adhesive and preparation method of grating | 珠海莫界科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119462540-A | Optical monomer and preparation method thereof, composition, resin material and preparation method and application thereof | 珠海莫界科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-115340834-B | Explosion-proof membrane and preparation method thereof | 新纶电子材料(常州)有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-113825818-B | Photocurable adhesive composition | 汉高股份有限及两合公司 | 2024-03-01 | — | — | CN | claimed |
| WO-2023230378-A1 | ADDITIVE MANUFACTURING AND POST-TREATMENT OF INORGANIC MATERIALS | 3D ARCHITECH, INC. (US) | 2023-11-30 | — | — | WO | claimed |
| US-20120120347-A1 | OPTICAL RESIN COMPOSITION, OPTICAL RESIN MATERIAL USING THE SAME, OPTICAL FILTER FOR IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-05-17 | — | — | US | claimed |
| US-20120077898-A1 | Crosslinked Polyolefin Polymer Blends | EXXONMOBIL CHEMICAL PATENTS INC. | 2012-03-29 | — | — | US | claimed |
| WO-2012015205-A1 | REFLECTION SHEET FOR BACKLIGHT UNIT | SKC HAAS DISPLAY FILM COMPANY (KR) | 2012-02-02 | — | — | WO | claimed |
| US-20100247940-A1 | Optical resin composition, optical resin material using the same, optical filter for image display device, and image display device | HITACHI CHEMICAL CO., LTD. (JP) | 2010-09-30 | — | — | US | claimed |
| EP-2182410-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THOSE PRODUCTS | Hitachi Chemical Company, Ltd. (JP) | 2010-05-05 | — | — | EP | claimed |
| US-20100027950-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN CURED MATTER, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE RESIN FILM CURED MATTER AND OPTICAL WAVEGUIDE OBTAINED BY USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-02-04 | — | — | US | claimed |
| EP-2053087-A1 | RESIN COMPOSITION FOR OPTICAL USE, RESIN MATERIAL FOR OPTICAL USE USING THE SAME, OPTICAL FILTER FOR IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE | Hitachi Chemical Co., Ltd. (JP) | 2009-04-29 | — | — | EP | claimed |
| WO-2008079519-A1 | PHOTOSENSITIVE COMPOSITION WITH LOW YELLOWING UNDER UV-LIGHT AND SUNLIGHT EXPOSURE | CLAST TRADING LIMITED (CN) | 2008-07-03 | — | — | WO | claimed |
| US-7309550-B2 | Photosensitive composition with low yellowing under UV-light and sunlight exposure | CHEMENCE, INC. (US) | 2007-12-18 | — | — | US | claimed |
| US-20070099119-A1 | Photosensitive composition with low yellowing under UV-light and sunlight exposure | CHEMENCE, INC. | 2007-05-03 | — | — | US | claimed |